JPS535564B2 - - Google Patents

Info

Publication number
JPS535564B2
JPS535564B2 JP1631474A JP1631474A JPS535564B2 JP S535564 B2 JPS535564 B2 JP S535564B2 JP 1631474 A JP1631474 A JP 1631474A JP 1631474 A JP1631474 A JP 1631474A JP S535564 B2 JPS535564 B2 JP S535564B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1631474A
Other languages
Japanese (ja)
Other versions
JPS50109003A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1631474A priority Critical patent/JPS535564B2/ja
Priority to AU78081/75A priority patent/AU7808175A/en
Priority to BE153275A priority patent/BE825436A/fr
Priority to GB600975A priority patent/GB1505505A/en
Priority to NL7501652A priority patent/NL7501652A/xx
Priority to DE19752505743 priority patent/DE2505743A1/de
Priority to FR7504304A priority patent/FR2260814B1/fr
Publication of JPS50109003A publication Critical patent/JPS50109003A/ja
Priority to US05/865,217 priority patent/US4197125A/en
Publication of JPS535564B2 publication Critical patent/JPS535564B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L97/00—Compositions of lignin-containing materials
    • C08L97/02—Lignocellulosic material, e.g. wood, straw or bagasse
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP1631474A 1974-02-12 1974-02-12 Expired JPS535564B2 (enrdf_load_stackoverflow)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP1631474A JPS535564B2 (enrdf_load_stackoverflow) 1974-02-12 1974-02-12
AU78081/75A AU7808175A (en) 1974-02-12 1975-02-11 Supports for photosensitive resin printing plates
BE153275A BE825436A (fr) 1974-02-12 1975-02-12 Supports de plaques pour impression a base de resine photosensible
GB600975A GB1505505A (en) 1974-02-12 1975-02-12 Photosensitive element for use in preparing printing plat
NL7501652A NL7501652A (nl) 1974-02-12 1975-02-12 Dragers voor drukplaten vervaardigd van een fo- oelige hars.
DE19752505743 DE2505743A1 (de) 1974-02-12 1975-02-12 Traeger fuer lichtempfindliche harzdruckplatten
FR7504304A FR2260814B1 (enrdf_load_stackoverflow) 1974-02-12 1975-02-12
US05/865,217 US4197125A (en) 1974-02-12 1977-12-28 Process of making photosensitive resin printing plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1631474A JPS535564B2 (enrdf_load_stackoverflow) 1974-02-12 1974-02-12

Publications (2)

Publication Number Publication Date
JPS50109003A JPS50109003A (enrdf_load_stackoverflow) 1975-08-27
JPS535564B2 true JPS535564B2 (enrdf_load_stackoverflow) 1978-02-28

Family

ID=11913041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1631474A Expired JPS535564B2 (enrdf_load_stackoverflow) 1974-02-12 1974-02-12

Country Status (2)

Country Link
JP (1) JPS535564B2 (enrdf_load_stackoverflow)
BE (1) BE825436A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4179531A (en) * 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition

Also Published As

Publication number Publication date
JPS50109003A (enrdf_load_stackoverflow) 1975-08-27
BE825436A (fr) 1975-05-29

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