JPS534423B2 - - Google Patents
Info
- Publication number
- JPS534423B2 JPS534423B2 JP13029674A JP13029674A JPS534423B2 JP S534423 B2 JPS534423 B2 JP S534423B2 JP 13029674 A JP13029674 A JP 13029674A JP 13029674 A JP13029674 A JP 13029674A JP S534423 B2 JPS534423 B2 JP S534423B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13029674A JPS5156226A (ja) | 1974-11-11 | 1974-11-11 | Hojitaipukankoseijushino genzozai |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13029674A JPS5156226A (ja) | 1974-11-11 | 1974-11-11 | Hojitaipukankoseijushino genzozai |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5156226A JPS5156226A (ja) | 1976-05-17 |
| JPS534423B2 true JPS534423B2 (cs) | 1978-02-17 |
Family
ID=15030911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13029674A Granted JPS5156226A (ja) | 1974-11-11 | 1974-11-11 | Hojitaipukankoseijushino genzozai |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5156226A (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0101010A1 (de) * | 1982-08-13 | 1984-02-22 | Hoechst Aktiengesellschaft | Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4141733A (en) * | 1977-10-25 | 1979-02-27 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions |
| CA1120763A (en) * | 1977-11-23 | 1982-03-30 | James A. Carothers | Enhancement of resist development |
| US4294911A (en) * | 1979-06-18 | 1981-10-13 | Eastman Kodak Company | Development of light-sensitive quinone diazide compositions using sulfite stabilizer |
| JPS59219743A (ja) * | 1983-05-28 | 1984-12-11 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト現像液 |
| US4606999A (en) * | 1983-12-21 | 1986-08-19 | Thiokol Corporation | Development of positive photoresists using cyclic quaternary ammonium hydroxides |
| US4711836A (en) * | 1984-09-10 | 1987-12-08 | Olin Hunt Specialty Products, Inc. | Development of positive-working photoresist compositions |
-
1974
- 1974-11-11 JP JP13029674A patent/JPS5156226A/ja active Granted
Non-Patent Citations (1)
| Title |
|---|
| IBM TECHNICAL DISCLOSURE BULLETIN=1970 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0101010A1 (de) * | 1982-08-13 | 1984-02-22 | Hoechst Aktiengesellschaft | Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5156226A (ja) | 1976-05-17 |