JPS534027A - Process for preparing dehydrated glass - Google Patents
Process for preparing dehydrated glassInfo
- Publication number
- JPS534027A JPS534027A JP7855276A JP7855276A JPS534027A JP S534027 A JPS534027 A JP S534027A JP 7855276 A JP7855276 A JP 7855276A JP 7855276 A JP7855276 A JP 7855276A JP S534027 A JPS534027 A JP S534027A
- Authority
- JP
- Japan
- Prior art keywords
- preparing dehydrated
- dehydrated glass
- glass
- preparing
- dehydrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manufacture, Treatment Of Glass Fibers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7855276A JPS534027A (en) | 1976-07-02 | 1976-07-02 | Process for preparing dehydrated glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7855276A JPS534027A (en) | 1976-07-02 | 1976-07-02 | Process for preparing dehydrated glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS534027A true JPS534027A (en) | 1978-01-14 |
| JPS5439497B2 JPS5439497B2 (ref) | 1979-11-28 |
Family
ID=13665071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7855276A Granted JPS534027A (en) | 1976-07-02 | 1976-07-02 | Process for preparing dehydrated glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS534027A (ref) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4583997A (en) * | 1983-10-25 | 1986-04-22 | Wacker-Chemitronic Gesellschaft Fur Elektronik Grundstoffe Mbh | Process for reducing the hydroxyl content of optical waveguides |
| JPS61162729U (ref) * | 1985-03-28 | 1986-10-08 | ||
| JPH045217A (ja) * | 1990-04-24 | 1992-01-09 | Kao Corp | 被覆顔料及びこれを含有する化粧料 |
| JP2019502644A (ja) * | 2015-12-18 | 2019-01-31 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 溶融炉内での露点監視による石英ガラス体の調製 |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| US11236002B2 (en) | 2015-12-18 | 2022-02-01 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of an opaque quartz glass body |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| US11492285B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies from silicon dioxide granulate |
| US11708290B2 (en) | 2015-12-18 | 2023-07-25 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5051517A (ref) * | 1973-09-08 | 1975-05-08 |
-
1976
- 1976-07-02 JP JP7855276A patent/JPS534027A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5051517A (ref) * | 1973-09-08 | 1975-05-08 |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4583997A (en) * | 1983-10-25 | 1986-04-22 | Wacker-Chemitronic Gesellschaft Fur Elektronik Grundstoffe Mbh | Process for reducing the hydroxyl content of optical waveguides |
| JPS61162729U (ref) * | 1985-03-28 | 1986-10-08 | ||
| JPH045217A (ja) * | 1990-04-24 | 1992-01-09 | Kao Corp | 被覆顔料及びこれを含有する化粧料 |
| JP2019502644A (ja) * | 2015-12-18 | 2019-01-31 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 溶融炉内での露点監視による石英ガラス体の調製 |
| US11053152B2 (en) | 2015-12-18 | 2021-07-06 | Heraeus Quarzglas Gmbh & Co. Kg | Spray granulation of silicon dioxide in the preparation of quartz glass |
| US11236002B2 (en) | 2015-12-18 | 2022-02-01 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of an opaque quartz glass body |
| US11299417B2 (en) | 2015-12-18 | 2022-04-12 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a melting crucible of refractory metal |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| US11492282B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies with dew point monitoring in the melting oven |
| US11492285B2 (en) | 2015-12-18 | 2022-11-08 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of quartz glass bodies from silicon dioxide granulate |
| US11708290B2 (en) | 2015-12-18 | 2023-07-25 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body in a multi-chamber oven |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5439497B2 (ref) | 1979-11-28 |
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