JPS5340274A - Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor - Google Patents

Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Info

Publication number
JPS5340274A
JPS5340274A JP11550676A JP11550676A JPS5340274A JP S5340274 A JPS5340274 A JP S5340274A JP 11550676 A JP11550676 A JP 11550676A JP 11550676 A JP11550676 A JP 11550676A JP S5340274 A JPS5340274 A JP S5340274A
Authority
JP
Japan
Prior art keywords
liquiddgrowth
furnace
semiconductor
vapour pressure
controlling vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11550676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5525494B2 (enrdf_load_stackoverflow
Inventor
Tooru Tejima
Kijiyuu Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP11550676A priority Critical patent/JPS5340274A/ja
Publication of JPS5340274A publication Critical patent/JPS5340274A/ja
Publication of JPS5525494B2 publication Critical patent/JPS5525494B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Led Devices (AREA)
JP11550676A 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor Granted JPS5340274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11550676A JPS5340274A (en) 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11550676A JPS5340274A (en) 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Publications (2)

Publication Number Publication Date
JPS5340274A true JPS5340274A (en) 1978-04-12
JPS5525494B2 JPS5525494B2 (enrdf_load_stackoverflow) 1980-07-07

Family

ID=14664195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11550676A Granted JPS5340274A (en) 1976-09-27 1976-09-27 Apparatus for controlling vapour pressure in liquiddgrowth furnace for semiconductor

Country Status (1)

Country Link
JP (1) JPS5340274A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61155999A (ja) * 1984-12-24 1986-07-15 ボーテツク・インダストリーズ・エル・テイー・デイー 高光度輻射を行なう装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01168189U (enrdf_load_stackoverflow) * 1988-05-18 1989-11-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61155999A (ja) * 1984-12-24 1986-07-15 ボーテツク・インダストリーズ・エル・テイー・デイー 高光度輻射を行なう装置

Also Published As

Publication number Publication date
JPS5525494B2 (enrdf_load_stackoverflow) 1980-07-07

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