JPS5339750B2 - - Google Patents
Info
- Publication number
- JPS5339750B2 JPS5339750B2 JP13261476A JP13261476A JPS5339750B2 JP S5339750 B2 JPS5339750 B2 JP S5339750B2 JP 13261476 A JP13261476 A JP 13261476A JP 13261476 A JP13261476 A JP 13261476A JP S5339750 B2 JPS5339750 B2 JP S5339750B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13261476A JPS5357760A (en) | 1976-11-04 | 1976-11-04 | Electron beam exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13261476A JPS5357760A (en) | 1976-11-04 | 1976-11-04 | Electron beam exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5357760A JPS5357760A (en) | 1978-05-25 |
| JPS5339750B2 true JPS5339750B2 (en) | 1978-10-23 |
Family
ID=15085436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13261476A Granted JPS5357760A (en) | 1976-11-04 | 1976-11-04 | Electron beam exposure apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5357760A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5938689U (en) * | 1982-09-02 | 1984-03-12 | 井関農機株式会社 | Cleaning device for V-shaped gutter in circulating grain drying equipment |
| JPS6253232B2 (en) * | 1985-12-19 | 1987-11-09 | Seirei Ind |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7906958A (en) * | 1979-09-19 | 1981-03-23 | Philips Nv | METAL WIRE CATHOD FOR ELECTRON RADIUS. |
| JPS59169132A (en) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | Drawing device by electron beam |
| JPS59232415A (en) * | 1983-06-16 | 1984-12-27 | Toshiba Corp | Charged beam control method |
| JPS63105455A (en) * | 1986-10-21 | 1988-05-10 | Ulvac Corp | Valiable slit device |
| JP4578606B2 (en) * | 2000-02-09 | 2010-11-10 | 富士通セミコンダクター株式会社 | Charged particle beam drawing apparatus and charged particle beam size adjusting method |
| JP2006024624A (en) * | 2004-07-06 | 2006-01-26 | Toshiba Corp | Charged beam drawing apparatus and aperture adjusting method |
-
1976
- 1976-11-04 JP JP13261476A patent/JPS5357760A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5938689U (en) * | 1982-09-02 | 1984-03-12 | 井関農機株式会社 | Cleaning device for V-shaped gutter in circulating grain drying equipment |
| JPS6253232B2 (en) * | 1985-12-19 | 1987-11-09 | Seirei Ind |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5357760A (en) | 1978-05-25 |