JPS5337703B2 - - Google Patents

Info

Publication number
JPS5337703B2
JPS5337703B2 JP9109876A JP9109876A JPS5337703B2 JP S5337703 B2 JPS5337703 B2 JP S5337703B2 JP 9109876 A JP9109876 A JP 9109876A JP 9109876 A JP9109876 A JP 9109876A JP S5337703 B2 JPS5337703 B2 JP S5337703B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9109876A
Other languages
Japanese (ja)
Other versions
JPS5317075A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9109876A priority Critical patent/JPS5317075A/ja
Publication of JPS5317075A publication Critical patent/JPS5317075A/ja
Publication of JPS5337703B2 publication Critical patent/JPS5337703B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9109876A 1976-07-30 1976-07-30 Production of silicon mask for x-ray exposure Granted JPS5317075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9109876A JPS5317075A (en) 1976-07-30 1976-07-30 Production of silicon mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9109876A JPS5317075A (en) 1976-07-30 1976-07-30 Production of silicon mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS5317075A JPS5317075A (en) 1978-02-16
JPS5337703B2 true JPS5337703B2 (da) 1978-10-11

Family

ID=14017033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9109876A Granted JPS5317075A (en) 1976-07-30 1976-07-30 Production of silicon mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5317075A (da)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751814Y2 (da) * 1979-07-25 1982-11-11

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5934632A (ja) * 1982-08-23 1984-02-25 Toshiba Corp Ｘ線マスクの製造方法
US9152036B2 (en) 2013-09-23 2015-10-06 National Synchrotron Radiation Research Center X-ray mask structure and method for preparing the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5192181A (en) * 1975-02-10 1976-08-12 X senrokopataankeiseihoho oyobi masukukiban

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5192181A (en) * 1975-02-10 1976-08-12 X senrokopataankeiseihoho oyobi masukukiban

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5751814Y2 (da) * 1979-07-25 1982-11-11

Also Published As

Publication number Publication date
JPS5317075A (en) 1978-02-16

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