JPS533227B1 - - Google Patents

Info

Publication number
JPS533227B1
JPS533227B1 JP3479772A JP3479772A JPS533227B1 JP S533227 B1 JPS533227 B1 JP S533227B1 JP 3479772 A JP3479772 A JP 3479772A JP 3479772 A JP3479772 A JP 3479772A JP S533227 B1 JPS533227 B1 JP S533227B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3479772A
Other languages
Japanese (ja)
Other versions
JPS4736965A (en:Method
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4736965A publication Critical patent/JPS4736965A/ja
Publication of JPS533227B1 publication Critical patent/JPS533227B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/174—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being Group III-V material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S252/00—Compositions
    • Y10S252/95—Doping agent source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/912—Displacing pn junction

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP3479772A 1971-04-07 1972-04-06 Pending JPS533227B1 (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13195671A 1971-04-07 1971-04-07

Publications (2)

Publication Number Publication Date
JPS4736965A JPS4736965A (en:Method) 1972-11-30
JPS533227B1 true JPS533227B1 (en:Method) 1978-02-04

Family

ID=22451770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3479772A Pending JPS533227B1 (en:Method) 1971-04-07 1972-04-06

Country Status (8)

Country Link
US (1) US3762968A (en:Method)
JP (1) JPS533227B1 (en:Method)
CA (1) CA957784A (en:Method)
DE (1) DE2216031A1 (en:Method)
FR (1) FR2132690B1 (en:Method)
GB (1) GB1332775A (en:Method)
IT (1) IT950293B (en:Method)
NL (1) NL7204609A (en:Method)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3959037A (en) * 1975-04-30 1976-05-25 The United States Of America As Represented By The Secretary Of The Army Electron emitter and method of fabrication
US3972750A (en) * 1975-04-30 1976-08-03 The United States Of America As Represented By The Secretary Of The Army Electron emitter and method of fabrication
US3959038A (en) * 1975-04-30 1976-05-25 The United States Of America As Represented By The Secretary Of The Army Electron emitter and method of fabrication
JPS5269264A (en) * 1975-12-05 1977-06-08 Matsushita Electronics Corp Selected diffusion method
JPS5275269A (en) * 1975-12-19 1977-06-24 Matsushita Electronics Corp Selective diffusion method
JPS53119526A (en) * 1977-03-29 1978-10-19 Tachikawa Spring Co Seat supporting device
JPS53119525A (en) * 1977-03-29 1978-10-19 Tachikawa Spring Co Seat supporting device
JPS5721824A (en) * 1980-07-14 1982-02-04 Fujitsu Ltd Manufacture of semiconductor device
US5296783A (en) * 1991-06-04 1994-03-22 Rockwell International Corporation Dual filament lamp and drive apparatus for dimmable avionics displays
FI125181B (en) 2012-02-09 2015-06-30 Outotec Oyj METHOD FOR THE MANUFACTURE OF THE MELTING CURRENT AND FORMING THE MELTING CURED BY THE METHOD

Also Published As

Publication number Publication date
FR2132690A1 (en:Method) 1972-11-24
CA957784A (en) 1974-11-12
NL7204609A (en:Method) 1972-10-10
IT950293B (it) 1973-06-20
US3762968A (en) 1973-10-02
DE2216031A1 (de) 1972-10-12
JPS4736965A (en:Method) 1972-11-30
GB1332775A (en) 1973-10-03
FR2132690B1 (en:Method) 1977-12-23

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