JPS5330991A - Filament exchanging method for vacuum evaporation apparatus - Google Patents
Filament exchanging method for vacuum evaporation apparatusInfo
- Publication number
- JPS5330991A JPS5330991A JP10497276A JP10497276A JPS5330991A JP S5330991 A JPS5330991 A JP S5330991A JP 10497276 A JP10497276 A JP 10497276A JP 10497276 A JP10497276 A JP 10497276A JP S5330991 A JPS5330991 A JP S5330991A
- Authority
- JP
- Japan
- Prior art keywords
- filament
- evaporation apparatus
- vacuum evaporation
- exchanging method
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To prevent shortening of life of filament due to incomplete contact by loading another support with a filament, while evaporation is carried out, at outside of evaporation apparatus and independently of operation schedule.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10497276A JPS5330991A (en) | 1976-09-03 | 1976-09-03 | Filament exchanging method for vacuum evaporation apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10497276A JPS5330991A (en) | 1976-09-03 | 1976-09-03 | Filament exchanging method for vacuum evaporation apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5330991A true JPS5330991A (en) | 1978-03-23 |
Family
ID=14395005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10497276A Pending JPS5330991A (en) | 1976-09-03 | 1976-09-03 | Filament exchanging method for vacuum evaporation apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5330991A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60165371A (en) * | 1984-02-09 | 1985-08-28 | Ricoh Co Ltd | Vacuum apparatus and exchanging system of parts thereof |
JPS63119248A (en) * | 1987-10-23 | 1988-05-23 | Hitachi Ltd | Semiconductor device |
JPS63211661A (en) * | 1988-02-12 | 1988-09-02 | Hitachi Ltd | Lead frame |
FR3005064A1 (en) * | 2013-04-25 | 2014-10-31 | Valeo Illuminacion | VACUUM EVAPORATION METALLIZATION SYSTEM |
WO2014191688A1 (en) * | 2013-05-30 | 2014-12-04 | Universite Claude Bernard Lyon I | Sublimation head and implementation method |
-
1976
- 1976-09-03 JP JP10497276A patent/JPS5330991A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60165371A (en) * | 1984-02-09 | 1985-08-28 | Ricoh Co Ltd | Vacuum apparatus and exchanging system of parts thereof |
JPS63119248A (en) * | 1987-10-23 | 1988-05-23 | Hitachi Ltd | Semiconductor device |
JPH0526340B2 (en) * | 1987-10-23 | 1993-04-15 | Hitachi Seisakusho Kk | |
JPS63211661A (en) * | 1988-02-12 | 1988-09-02 | Hitachi Ltd | Lead frame |
FR3005064A1 (en) * | 2013-04-25 | 2014-10-31 | Valeo Illuminacion | VACUUM EVAPORATION METALLIZATION SYSTEM |
WO2014191688A1 (en) * | 2013-05-30 | 2014-12-04 | Universite Claude Bernard Lyon I | Sublimation head and implementation method |
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