JPS5330991A - Filament exchanging method for vacuum evaporation apparatus - Google Patents

Filament exchanging method for vacuum evaporation apparatus

Info

Publication number
JPS5330991A
JPS5330991A JP10497276A JP10497276A JPS5330991A JP S5330991 A JPS5330991 A JP S5330991A JP 10497276 A JP10497276 A JP 10497276A JP 10497276 A JP10497276 A JP 10497276A JP S5330991 A JPS5330991 A JP S5330991A
Authority
JP
Japan
Prior art keywords
filament
evaporation apparatus
vacuum evaporation
exchanging method
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10497276A
Other languages
Japanese (ja)
Inventor
Chikara Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP10497276A priority Critical patent/JPS5330991A/en
Publication of JPS5330991A publication Critical patent/JPS5330991A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent shortening of life of filament due to incomplete contact by loading another support with a filament, while evaporation is carried out, at outside of evaporation apparatus and independently of operation schedule.
JP10497276A 1976-09-03 1976-09-03 Filament exchanging method for vacuum evaporation apparatus Pending JPS5330991A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10497276A JPS5330991A (en) 1976-09-03 1976-09-03 Filament exchanging method for vacuum evaporation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10497276A JPS5330991A (en) 1976-09-03 1976-09-03 Filament exchanging method for vacuum evaporation apparatus

Publications (1)

Publication Number Publication Date
JPS5330991A true JPS5330991A (en) 1978-03-23

Family

ID=14395005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10497276A Pending JPS5330991A (en) 1976-09-03 1976-09-03 Filament exchanging method for vacuum evaporation apparatus

Country Status (1)

Country Link
JP (1) JPS5330991A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60165371A (en) * 1984-02-09 1985-08-28 Ricoh Co Ltd Vacuum apparatus and exchanging system of parts thereof
JPS63119248A (en) * 1987-10-23 1988-05-23 Hitachi Ltd Semiconductor device
JPS63211661A (en) * 1988-02-12 1988-09-02 Hitachi Ltd Lead frame
FR3005064A1 (en) * 2013-04-25 2014-10-31 Valeo Illuminacion VACUUM EVAPORATION METALLIZATION SYSTEM
WO2014191688A1 (en) * 2013-05-30 2014-12-04 Universite Claude Bernard Lyon I Sublimation head and implementation method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60165371A (en) * 1984-02-09 1985-08-28 Ricoh Co Ltd Vacuum apparatus and exchanging system of parts thereof
JPS63119248A (en) * 1987-10-23 1988-05-23 Hitachi Ltd Semiconductor device
JPH0526340B2 (en) * 1987-10-23 1993-04-15 Hitachi Seisakusho Kk
JPS63211661A (en) * 1988-02-12 1988-09-02 Hitachi Ltd Lead frame
FR3005064A1 (en) * 2013-04-25 2014-10-31 Valeo Illuminacion VACUUM EVAPORATION METALLIZATION SYSTEM
WO2014191688A1 (en) * 2013-05-30 2014-12-04 Universite Claude Bernard Lyon I Sublimation head and implementation method

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