JPS5330798A - Method of plasmaaetching of transparent conductive film - Google Patents

Method of plasmaaetching of transparent conductive film

Info

Publication number
JPS5330798A
JPS5330798A JP10467276A JP10467276A JPS5330798A JP S5330798 A JPS5330798 A JP S5330798A JP 10467276 A JP10467276 A JP 10467276A JP 10467276 A JP10467276 A JP 10467276A JP S5330798 A JPS5330798 A JP S5330798A
Authority
JP
Japan
Prior art keywords
plasmaaetching
conductive film
transparent conductive
transparent
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10467276A
Other languages
Japanese (ja)
Other versions
JPS5826603B2 (en
Inventor
Katsuzou Ukai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NICHIDEN VARIAN KK
Original Assignee
NICHIDEN VARIAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NICHIDEN VARIAN KK filed Critical NICHIDEN VARIAN KK
Priority to JP51104672A priority Critical patent/JPS5826603B2/en
Publication of JPS5330798A publication Critical patent/JPS5330798A/en
Publication of JPS5826603B2 publication Critical patent/JPS5826603B2/en
Expired legal-status Critical Current

Links

JP51104672A 1976-09-01 1976-09-01 Plasma etching method for transparent conductive film Expired JPS5826603B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51104672A JPS5826603B2 (en) 1976-09-01 1976-09-01 Plasma etching method for transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51104672A JPS5826603B2 (en) 1976-09-01 1976-09-01 Plasma etching method for transparent conductive film

Publications (2)

Publication Number Publication Date
JPS5330798A true JPS5330798A (en) 1978-03-23
JPS5826603B2 JPS5826603B2 (en) 1983-06-03

Family

ID=14386952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51104672A Expired JPS5826603B2 (en) 1976-09-01 1976-09-01 Plasma etching method for transparent conductive film

Country Status (1)

Country Link
JP (1) JPS5826603B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01259184A (en) * 1987-10-01 1989-10-16 Gunze Ltd Method and device for etching transparent conductive film

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2233286A (en) * 1989-06-01 1991-01-09 P Maguire Pattern processing on tin oxide films

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5141015A (en) * 1974-10-03 1976-04-06 Tokyo Ohka Kogyo Co Ltd Sankasuzumaku no etsuchinguhoho

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5141015A (en) * 1974-10-03 1976-04-06 Tokyo Ohka Kogyo Co Ltd Sankasuzumaku no etsuchinguhoho

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01259184A (en) * 1987-10-01 1989-10-16 Gunze Ltd Method and device for etching transparent conductive film

Also Published As

Publication number Publication date
JPS5826603B2 (en) 1983-06-03

Similar Documents

Publication Publication Date Title
JPS52132688A (en) Method of forming flat thin film
JPS5684809A (en) Method of forming transparent conductive film
JPS5682504A (en) Method of forming transparent conductive film
JPS52151639A (en) Plating method of film
JPS55133703A (en) Method of producing transparent conductive film
JPS569906A (en) Method of manufacturing transparent conductive film
JPS5610450A (en) Transparent conductive film
JPS5654702A (en) Method of manufactuping transparent conductive film
JPS5686408A (en) Method of forming transparent conductive film
JPS5330798A (en) Method of plasmaaetching of transparent conductive film
JPS569905A (en) Method of manufacturing transparent conductive film
JPS53703A (en) Method of make transparent original for photooengraving
JPS531858A (en) Method of forming thin film circuit
JPS5510704A (en) Transparent conductive film and method of manufacturing same
JPS5595207A (en) Conductive transparent film
JPS5378066A (en) Method of producing conductive thin film line
JPS5744910A (en) Method of forming transparent conductive film
JPS56126210A (en) Method of forming transparent conductive film
JPS5314636A (en) Method of forming metallized film
JPS52119677A (en) Method of manufacturing electroconductive films
JPS5569904A (en) Method of manufacturing transparent conductive film
JPS5290096A (en) Transparent conductive film and method of manufacture thereof
JPS52120929A (en) Method of etching transparent conductive films
JPS52137665A (en) Method of producing thin film circuit
JPS5331768A (en) Method of producing transparent film