JPS5329755U - - Google Patents

Info

Publication number
JPS5329755U
JPS5329755U JP11084876U JP11084876U JPS5329755U JP S5329755 U JPS5329755 U JP S5329755U JP 11084876 U JP11084876 U JP 11084876U JP 11084876 U JP11084876 U JP 11084876U JP S5329755 U JPS5329755 U JP S5329755U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11084876U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11084876U priority Critical patent/JPS5329755U/ja
Publication of JPS5329755U publication Critical patent/JPS5329755U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Oxygen, Ozone, And Oxides In General (AREA)
JP11084876U 1976-08-20 1976-08-20 Pending JPS5329755U (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11084876U JPS5329755U (zh) 1976-08-20 1976-08-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11084876U JPS5329755U (zh) 1976-08-20 1976-08-20

Publications (1)

Publication Number Publication Date
JPS5329755U true JPS5329755U (zh) 1978-03-14

Family

ID=28720720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11084876U Pending JPS5329755U (zh) 1976-08-20 1976-08-20

Country Status (1)

Country Link
JP (1) JPS5329755U (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008108331A1 (ja) * 2007-03-05 2008-09-12 Ohnit Co., Ltd. 低温プラズマ発生体

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008108331A1 (ja) * 2007-03-05 2008-09-12 Ohnit Co., Ltd. 低温プラズマ発生体

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