JPS5329237A - Gas reaction device - Google Patents

Gas reaction device

Info

Publication number
JPS5329237A
JPS5329237A JP10400676A JP10400676A JPS5329237A JP S5329237 A JPS5329237 A JP S5329237A JP 10400676 A JP10400676 A JP 10400676A JP 10400676 A JP10400676 A JP 10400676A JP S5329237 A JPS5329237 A JP S5329237A
Authority
JP
Japan
Prior art keywords
reaction device
gas reaction
gas
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10400676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5429411B2 (Direct
Inventor
Yasuhiro Horiike
Masahiro Shibagaki
Takashi Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP10400676A priority Critical patent/JPS5329237A/ja
Publication of JPS5329237A publication Critical patent/JPS5329237A/ja
Publication of JPS5429411B2 publication Critical patent/JPS5429411B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
JP10400676A 1976-08-31 1976-08-31 Gas reaction device Granted JPS5329237A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10400676A JPS5329237A (en) 1976-08-31 1976-08-31 Gas reaction device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10400676A JPS5329237A (en) 1976-08-31 1976-08-31 Gas reaction device

Publications (2)

Publication Number Publication Date
JPS5329237A true JPS5329237A (en) 1978-03-18
JPS5429411B2 JPS5429411B2 (Direct) 1979-09-22

Family

ID=14369170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10400676A Granted JPS5329237A (en) 1976-08-31 1976-08-31 Gas reaction device

Country Status (1)

Country Link
JP (1) JPS5329237A (Direct)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5456951A (en) * 1977-10-14 1979-05-08 Fujitsu Ltd Plasma etching device
JPS6289137U (Direct) * 1985-11-22 1987-06-08
JPH05269362A (ja) * 1992-03-27 1993-10-19 Hitachi Ltd 真空処理装置
US6332925B1 (en) 1996-05-23 2001-12-25 Ebara Corporation Evacuation system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5456951A (en) * 1977-10-14 1979-05-08 Fujitsu Ltd Plasma etching device
JPS6289137U (Direct) * 1985-11-22 1987-06-08
JPH05269362A (ja) * 1992-03-27 1993-10-19 Hitachi Ltd 真空処理装置
US6332925B1 (en) 1996-05-23 2001-12-25 Ebara Corporation Evacuation system

Also Published As

Publication number Publication date
JPS5429411B2 (Direct) 1979-09-22

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