JPS5326113B2 - - Google Patents
Info
- Publication number
- JPS5326113B2 JPS5326113B2 JP10452876A JP10452876A JPS5326113B2 JP S5326113 B2 JPS5326113 B2 JP S5326113B2 JP 10452876 A JP10452876 A JP 10452876A JP 10452876 A JP10452876 A JP 10452876A JP S5326113 B2 JPS5326113 B2 JP S5326113B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10452876A JPS5330277A (en) | 1976-09-01 | 1976-09-01 | Mask for x-ray exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10452876A JPS5330277A (en) | 1976-09-01 | 1976-09-01 | Mask for x-ray exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5330277A JPS5330277A (en) | 1978-03-22 |
| JPS5326113B2 true JPS5326113B2 (fr) | 1978-07-31 |
Family
ID=14382982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10452876A Granted JPS5330277A (en) | 1976-09-01 | 1976-09-01 | Mask for x-ray exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5330277A (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63133524A (ja) * | 1986-11-25 | 1988-06-06 | Matsushita Electronics Corp | Ｘ線マスクおよびその製造方法 |
-
1976
- 1976-09-01 JP JP10452876A patent/JPS5330277A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5330277A (en) | 1978-03-22 |