JPS5326112B2 - - Google Patents
Info
- Publication number
- JPS5326112B2 JPS5326112B2 JP10357676A JP10357676A JPS5326112B2 JP S5326112 B2 JPS5326112 B2 JP S5326112B2 JP 10357676 A JP10357676 A JP 10357676A JP 10357676 A JP10357676 A JP 10357676A JP S5326112 B2 JPS5326112 B2 JP S5326112B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10357676A JPS5329671A (en) | 1976-09-01 | 1976-09-01 | Photomask cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10357676A JPS5329671A (en) | 1976-09-01 | 1976-09-01 | Photomask cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5329671A JPS5329671A (en) | 1978-03-20 |
| JPS5326112B2 true JPS5326112B2 (online.php) | 1978-07-31 |
Family
ID=14357603
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10357676A Granted JPS5329671A (en) | 1976-09-01 | 1976-09-01 | Photomask cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5329671A (online.php) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5911629A (ja) * | 1982-07-12 | 1984-01-21 | Toshiba Corp | 表面清浄化方法 |
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1976
- 1976-09-01 JP JP10357676A patent/JPS5329671A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5329671A (en) | 1978-03-20 |