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Application filedfiledCritical
Priority to JP2960276ApriorityCriticalpatent/JPS52112405A/ja
Publication of JPS52112405ApublicationCriticalpatent/JPS52112405A/ja
Publication of JPS5323721B2publicationCriticalpatent/JPS5323721B2/ja
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
JP2960276A1976-03-181976-03-18Method of and apparatus for closely contacting printing form and plate material on printing machine
GrantedJPS52112405A
(en)