JPS532361B2 - - Google Patents
Info
- Publication number
- JPS532361B2 JPS532361B2 JP2104874A JP2104874A JPS532361B2 JP S532361 B2 JPS532361 B2 JP S532361B2 JP 2104874 A JP2104874 A JP 2104874A JP 2104874 A JP2104874 A JP 2104874A JP S532361 B2 JPS532361 B2 JP S532361B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2104874A JPS532361B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-02-23 | 1974-02-23 | |
| AU78430/75A AU487244B2 (en) | 1974-02-23 | 1975-02-02 | Photosensitive resin compositions |
| GB720375A GB1489467A (en) | 1974-02-23 | 1975-02-20 | Photosensitive resin compositions |
| NL7502120A NL7502120A (nl) | 1974-02-23 | 1975-02-21 | Werkwijze ter bereiding van fotogevoelige hars- samenstellingen alsmede gevormde voortbrengse- len geheel of gedeeltelijk bestaande uit deze harssamenstellingen. |
| BE153569A BE825793A (fr) | 1974-02-23 | 1975-02-21 | Compositions resineuses photosensibles |
| FR7505689A FR2262328A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-02-23 | 1975-02-24 | |
| DE19752507874 DE2507874C3 (de) | 1974-02-23 | 1975-02-24 | Lichtempfindliche Harzmasse |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2104874A JPS532361B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-02-23 | 1974-02-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50117502A JPS50117502A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1975-09-13 |
| JPS532361B2 true JPS532361B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1978-01-27 |
Family
ID=12044027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2104874A Expired JPS532361B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1974-02-23 | 1974-02-23 |
Country Status (6)
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5729692B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1974-09-17 | 1982-06-24 | ||
| US4179531A (en) * | 1977-08-23 | 1979-12-18 | W. R. Grace & Co. | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
| JPS61254605A (ja) * | 1985-05-07 | 1986-11-12 | Asahi Chem Ind Co Ltd | 感光性組成物 |
| JPH01182845A (ja) * | 1988-01-13 | 1989-07-20 | Toyobo Co Ltd | 感光性樹脂組成物 |
| US4911999A (en) * | 1988-12-13 | 1990-03-27 | E. I. Du Pont De Nemours And Company | Electrostatic master containing thiourea or thioamide electrostatic decay additive for high speed xeroprinting |
| DE3909003A1 (de) * | 1989-03-18 | 1990-09-27 | Basf Ag | Photopolymerisierbares schichtuebertragungsmaterial |
| US6569602B1 (en) * | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
| CN112341638B (zh) * | 2020-11-05 | 2022-07-15 | 云南师范大学 | 一种多孔结构水凝胶材料及其制备与应用 |
-
1974
- 1974-02-23 JP JP2104874A patent/JPS532361B2/ja not_active Expired
-
1975
- 1975-02-20 GB GB720375A patent/GB1489467A/en not_active Expired
- 1975-02-21 BE BE153569A patent/BE825793A/xx unknown
- 1975-02-21 NL NL7502120A patent/NL7502120A/xx not_active Application Discontinuation
- 1975-02-24 FR FR7505689A patent/FR2262328A1/fr not_active Withdrawn
- 1975-02-24 DE DE19752507874 patent/DE2507874C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2507874B2 (de) | 1981-04-30 |
| BE825793A (fr) | 1975-06-16 |
| GB1489467A (en) | 1977-10-19 |
| AU7843075A (en) | 1976-08-26 |
| NL7502120A (nl) | 1975-08-26 |
| JPS50117502A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1975-09-13 |
| FR2262328A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1975-09-19 |
| DE2507874A1 (de) | 1975-08-28 |
| DE2507874C3 (de) | 1982-04-08 |