JPS5322879A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
JPS5322879A
JPS5322879A JP9802676A JP9802676A JPS5322879A JP S5322879 A JPS5322879 A JP S5322879A JP 9802676 A JP9802676 A JP 9802676A JP 9802676 A JP9802676 A JP 9802676A JP S5322879 A JPS5322879 A JP S5322879A
Authority
JP
Japan
Prior art keywords
sputtering apparatus
target
errosion
uselessness
magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9802676A
Other languages
Japanese (ja)
Inventor
Masaji Arai
Keizaburo Kuramasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9802676A priority Critical patent/JPS5322879A/en
Publication of JPS5322879A publication Critical patent/JPS5322879A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Abstract

PURPOSE:The sputtering apparatus, decreased the uselessness of material and having a high efficiency, by having the magnet, generating the leakage magnetic field, such as producing the continuous errosion pattern on the surface of target, within the inside of hollow cylindrical target.
JP9802676A 1976-08-16 1976-08-16 Sputtering apparatus Pending JPS5322879A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9802676A JPS5322879A (en) 1976-08-16 1976-08-16 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9802676A JPS5322879A (en) 1976-08-16 1976-08-16 Sputtering apparatus

Publications (1)

Publication Number Publication Date
JPS5322879A true JPS5322879A (en) 1978-03-02

Family

ID=14208410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9802676A Pending JPS5322879A (en) 1976-08-16 1976-08-16 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS5322879A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57114663A (en) * 1980-08-08 1982-07-16 Battelle Development Corp Cylindrical magnetron sputtering cathode and sputtering apparatus equipped therewith

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57114663A (en) * 1980-08-08 1982-07-16 Battelle Development Corp Cylindrical magnetron sputtering cathode and sputtering apparatus equipped therewith

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