JPS5322425B2 - - Google Patents

Info

Publication number
JPS5322425B2
JPS5322425B2 JP1565275A JP1565275A JPS5322425B2 JP S5322425 B2 JPS5322425 B2 JP S5322425B2 JP 1565275 A JP1565275 A JP 1565275A JP 1565275 A JP1565275 A JP 1565275A JP S5322425 B2 JPS5322425 B2 JP S5322425B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1565275A
Other versions
JPS5190274A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1565275A priority Critical patent/JPS5190274A/ja
Publication of JPS5190274A publication Critical patent/JPS5190274A/ja
Publication of JPS5322425B2 publication Critical patent/JPS5322425B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
JP1565275A 1975-02-05 1975-02-05 Fuotomasukuno seizohoho Granted JPS5190274A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1565275A JPS5190274A (en) 1975-02-05 1975-02-05 Fuotomasukuno seizohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1565275A JPS5190274A (en) 1975-02-05 1975-02-05 Fuotomasukuno seizohoho

Publications (2)

Publication Number Publication Date
JPS5190274A JPS5190274A (en) 1976-08-07
JPS5322425B2 true JPS5322425B2 (ja) 1978-07-08

Family

ID=11894639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1565275A Granted JPS5190274A (en) 1975-02-05 1975-02-05 Fuotomasukuno seizohoho

Country Status (1)

Country Link
JP (1) JPS5190274A (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154735A (en) * 1979-05-22 1980-12-02 Sharp Corp Manufacture of semiconductor device
JP2765065B2 (ja) * 1989-06-30 1998-06-11 ソニー株式会社 クロム系膜のパターン形成方法
JP2000214575A (ja) 1999-01-26 2000-08-04 Sharp Corp クロムマスクの形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3837856A (en) * 1967-04-04 1974-09-24 Signetics Corp Method for removing photoresist in manufacture of semiconductor devices
JPS5441870B2 (ja) * 1972-11-22 1979-12-11
JPS586941B2 (ja) * 1973-11-12 1983-02-07 富士通株式会社 フオト マスク ノ セイゾウホウホウ

Also Published As

Publication number Publication date
JPS5190274A (en) 1976-08-07

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