JPS5322423B2 - - Google Patents

Info

Publication number
JPS5322423B2
JPS5322423B2 JP430575A JP430575A JPS5322423B2 JP S5322423 B2 JPS5322423 B2 JP S5322423B2 JP 430575 A JP430575 A JP 430575A JP 430575 A JP430575 A JP 430575A JP S5322423 B2 JPS5322423 B2 JP S5322423B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP430575A
Other languages
Japanese (ja)
Other versions
JPS50103977A (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50103977A publication Critical patent/JPS50103977A/ja
Publication of JPS5322423B2 publication Critical patent/JPS5322423B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6302Non-deposition formation processes
    • H10P14/6304Formation by oxidation, e.g. oxidation of the substrate
    • H10P14/6314Formation by oxidation, e.g. oxidation of the substrate of a metallic layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69Inorganic materials
    • H10P14/692Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/6939Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal
    • H10P14/69394Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal the material containing titanium, e.g. TiO2
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143Electron beam

Landscapes

  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP430575A 1974-01-08 1975-01-07 Expired JPS5322423B2 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US431656A US3867148A (en) 1974-01-08 1974-01-08 Making of micro-miniature electronic components by selective oxidation

Publications (2)

Publication Number Publication Date
JPS50103977A JPS50103977A (https=) 1975-08-16
JPS5322423B2 true JPS5322423B2 (https=) 1978-07-08

Family

ID=23712876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP430575A Expired JPS5322423B2 (https=) 1974-01-08 1975-01-07

Country Status (2)

Country Link
US (1) US3867148A (https=)
JP (1) JPS5322423B2 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522252U (https=) * 1978-07-31 1980-02-13
JPH0431612U (https=) * 1990-07-13 1992-03-13

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141621A (en) * 1977-08-05 1979-02-27 Honeywell Inc. Three layer waveguide for thin film lens fabrication
US4115120A (en) * 1977-09-29 1978-09-19 International Business Machines Corporation Method of forming thin film patterns by differential pre-baking of resist
US4180604A (en) * 1977-12-30 1979-12-25 International Business Machines Corporation Two layer resist system
US4144101A (en) * 1978-06-05 1979-03-13 International Business Machines Corporation Process for providing self-aligned doping regions by ion-implantation and lift-off
US4238559A (en) * 1978-08-24 1980-12-09 International Business Machines Corporation Two layer resist system
US4283483A (en) * 1979-07-19 1981-08-11 Hughes Aircraft Company Process for forming semiconductor devices using electron-sensitive resist patterns with controlled line profiles
US4341850A (en) * 1979-07-19 1982-07-27 Hughes Aircraft Company Mask structure for forming semiconductor devices, comprising electron-sensitive resist patterns with controlled line profiles
US4524126A (en) * 1981-06-30 1985-06-18 International Business Machines Corporation Adhesion of a photoresist to a substrate
US4496419A (en) * 1983-02-28 1985-01-29 Cornell Research Foundation, Inc. Fine line patterning method for submicron devices
DE3427556C1 (de) * 1984-07-26 1986-01-02 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur Herstellung von Fotoresist-Reliefstrukturen mit UEberhangcharakter
JPS6142140A (ja) * 1984-07-30 1986-02-28 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 自己整合構造の形成方法
US4619894A (en) * 1985-04-12 1986-10-28 Massachusetts Institute Of Technology Solid-transformation thermal resist
JPH01158731A (ja) * 1987-12-15 1989-06-21 Fujitsu Ltd 光電子転写露光方法およびこれに用いられるマスク
US5900351A (en) * 1995-01-17 1999-05-04 International Business Machines Corporation Method for stripping photoresist
FR2852144B1 (fr) * 2003-03-05 2005-06-10 Commissariat Energie Atomique Procede de delimitation d'un element conducteur dispose sur une couche isolante, dispositif et transistor obtenus par ce procede
CN101815610A (zh) * 2007-09-20 2010-08-25 爱克发-格法特公司 具有层间层压透明模压聚合物全息图的安全层压材料
EP2042576A1 (en) * 2007-09-20 2009-04-01 Agfa-Gevaert Security laminates with interlaminated transparent embossed polymer hologram.
US20100320743A1 (en) * 2008-04-01 2010-12-23 Agfa-Gevaert Security laminate having a security feature
US20100316841A1 (en) * 2008-04-01 2010-12-16 Agfa-Gevaert Lamination process for producing security laminates
CN105150656A (zh) * 2008-04-01 2015-12-16 爱克发-格法特公司 具有可通过触摸察觉的安全性特征的安全性层压板
EP2181858A1 (en) * 2008-11-04 2010-05-05 Agfa-Gevaert N.V. Security document and methods of producing it
EP2199100A1 (en) * 2008-12-22 2010-06-23 Agfa-Gevaert N.V. Security laminates for security documents.
EP2332738B1 (en) 2009-12-10 2012-07-04 Agfa-Gevaert Security document with security feature on edge
PL2335937T3 (pl) 2009-12-18 2013-06-28 Agfa Gevaert Znakowalna laserowo folia zabezpieczająca
PL2335938T3 (pl) 2009-12-18 2013-07-31 Agfa Gevaert Znakowalna laserowo folia zabezpieczająca

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3799777A (en) * 1972-06-20 1974-03-26 Westinghouse Electric Corp Micro-miniature electronic components by double rejection
JPS524149A (en) * 1975-06-27 1977-01-13 Nec Home Electronics Ltd Television broadcasting receiving system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522252U (https=) * 1978-07-31 1980-02-13
JPH0431612U (https=) * 1990-07-13 1992-03-13

Also Published As

Publication number Publication date
JPS50103977A (https=) 1975-08-16
US3867148A (en) 1975-02-18

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