JPS5314930B2 - - Google Patents
Info
- Publication number
- JPS5314930B2 JPS5314930B2 JP1111075A JP1111075A JPS5314930B2 JP S5314930 B2 JPS5314930 B2 JP S5314930B2 JP 1111075 A JP1111075 A JP 1111075A JP 1111075 A JP1111075 A JP 1111075A JP S5314930 B2 JPS5314930 B2 JP S5314930B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/40—Chemically transforming developed images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1111075A JPS5314930B2 (en:Method) | 1975-01-27 | 1975-01-27 | |
| DE19762602934 DE2602934A1 (de) | 1975-01-27 | 1976-01-27 | Verfahren zur bilderzeugung |
| NL7600797A NL7600797A (nl) | 1975-01-27 | 1976-01-27 | Beeldvormingswerkwijze. |
| US05/814,943 US4207105A (en) | 1975-01-27 | 1977-07-12 | Plasma-etching image in exposed AgX emulsion |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1111075A JPS5314930B2 (en:Method) | 1975-01-27 | 1975-01-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5185723A JPS5185723A (en:Method) | 1976-07-27 |
| JPS5314930B2 true JPS5314930B2 (en:Method) | 1978-05-20 |
Family
ID=11768858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1111075A Expired JPS5314930B2 (en:Method) | 1975-01-27 | 1975-01-27 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5314930B2 (en:Method) |
| DE (1) | DE2602934A1 (en:Method) |
| NL (1) | NL7600797A (en:Method) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5654440A (en) * | 1979-10-11 | 1981-05-14 | Dainippon Printing Co Ltd | Photosensitive lithographic material and plate making method |
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1975
- 1975-01-27 JP JP1111075A patent/JPS5314930B2/ja not_active Expired
-
1976
- 1976-01-27 DE DE19762602934 patent/DE2602934A1/de not_active Withdrawn
- 1976-01-27 NL NL7600797A patent/NL7600797A/xx not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| NL7600797A (nl) | 1976-07-29 |
| DE2602934A1 (de) | 1976-07-29 |
| JPS5185723A (en:Method) | 1976-07-27 |