JPS53138943A - Etching method and apparatus - Google Patents
Etching method and apparatusInfo
- Publication number
- JPS53138943A JPS53138943A JP5454577A JP5454577A JPS53138943A JP S53138943 A JPS53138943 A JP S53138943A JP 5454577 A JP5454577 A JP 5454577A JP 5454577 A JP5454577 A JP 5454577A JP S53138943 A JPS53138943 A JP S53138943A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- etching method
- amt
- etched
- substances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To control etching amt. with a high accuracy by introducing etching gas into an etching chamber to carry out etching; radiating light to substances to be etched; and detecting a change in reflected light.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5454577A JPS53138943A (en) | 1977-05-11 | 1977-05-11 | Etching method and apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5454577A JPS53138943A (en) | 1977-05-11 | 1977-05-11 | Etching method and apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53138943A true JPS53138943A (en) | 1978-12-04 |
Family
ID=12973640
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5454577A Pending JPS53138943A (en) | 1977-05-11 | 1977-05-11 | Etching method and apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53138943A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5728334A (en) * | 1980-07-28 | 1982-02-16 | Fujitsu Ltd | Etching method |
JPS593925A (en) * | 1982-06-29 | 1984-01-10 | Ulvac Corp | Dry etching control and end-point detection method |
EP0119455A2 (en) * | 1983-02-14 | 1984-09-26 | Hitachi, Ltd. | Etching method and apparatus |
JPS59181537A (en) * | 1983-03-31 | 1984-10-16 | Fujitsu Ltd | Etching method |
JPS60253228A (en) * | 1984-05-30 | 1985-12-13 | Hitachi Ltd | Monitoring of etching |
JPS62271434A (en) * | 1986-05-20 | 1987-11-25 | Hitachi Ltd | Detection of point of completion of etching |
US5584933A (en) * | 1993-08-31 | 1996-12-17 | Sony Corporation | Process for plasma deposition and plasma CVD apparatus |
US5824158A (en) * | 1993-06-30 | 1998-10-20 | Kabushiki Kaisha Kobe Seiko Sho | Chemical vapor deposition using inductively coupled plasma and system therefor |
-
1977
- 1977-05-11 JP JP5454577A patent/JPS53138943A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5728334A (en) * | 1980-07-28 | 1982-02-16 | Fujitsu Ltd | Etching method |
JPH0157494B2 (en) * | 1980-07-28 | 1989-12-06 | Fujitsu Ltd | |
JPS593925A (en) * | 1982-06-29 | 1984-01-10 | Ulvac Corp | Dry etching control and end-point detection method |
EP0119455A2 (en) * | 1983-02-14 | 1984-09-26 | Hitachi, Ltd. | Etching method and apparatus |
JPS59181537A (en) * | 1983-03-31 | 1984-10-16 | Fujitsu Ltd | Etching method |
JPH0343775B2 (en) * | 1983-03-31 | 1991-07-03 | Fujitsu Ltd | |
JPS60253228A (en) * | 1984-05-30 | 1985-12-13 | Hitachi Ltd | Monitoring of etching |
JPS62271434A (en) * | 1986-05-20 | 1987-11-25 | Hitachi Ltd | Detection of point of completion of etching |
US5824158A (en) * | 1993-06-30 | 1998-10-20 | Kabushiki Kaisha Kobe Seiko Sho | Chemical vapor deposition using inductively coupled plasma and system therefor |
US5584933A (en) * | 1993-08-31 | 1996-12-17 | Sony Corporation | Process for plasma deposition and plasma CVD apparatus |
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