JPS53138790A - Method and device for full electronic monitor - Google Patents
Method and device for full electronic monitorInfo
- Publication number
- JPS53138790A JPS53138790A JP5349577A JP5349577A JPS53138790A JP S53138790 A JPS53138790 A JP S53138790A JP 5349577 A JP5349577 A JP 5349577A JP 5349577 A JP5349577 A JP 5349577A JP S53138790 A JPS53138790 A JP S53138790A
- Authority
- JP
- Japan
- Prior art keywords
- electronic monitor
- full electronic
- signal
- unevenness
- eliminating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
Abstract
PURPOSE:To secure a real element concentration distribution plus its image by giving a division to the Auger signal of a specified element given from the uneven area of the test sample with the signal caught by the secondary electron catching electrode which is provided newly and thus eliminating the effect of the unevenness on the sample surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5349577A JPS53138790A (en) | 1977-05-10 | 1977-05-10 | Method and device for full electronic monitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5349577A JPS53138790A (en) | 1977-05-10 | 1977-05-10 | Method and device for full electronic monitor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53138790A true JPS53138790A (en) | 1978-12-04 |
Family
ID=12944404
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5349577A Pending JPS53138790A (en) | 1977-05-10 | 1977-05-10 | Method and device for full electronic monitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53138790A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4740693A (en) * | 1984-12-14 | 1988-04-26 | Hitachi, Ltd. | Electron beam pattern line width measurement system |
JP2012160261A (en) * | 2011-01-28 | 2012-08-23 | National Institute Of Advanced Industrial & Technology | Axis alignment method and device of energy analyzer |
-
1977
- 1977-05-10 JP JP5349577A patent/JPS53138790A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4740693A (en) * | 1984-12-14 | 1988-04-26 | Hitachi, Ltd. | Electron beam pattern line width measurement system |
JP2012160261A (en) * | 2011-01-28 | 2012-08-23 | National Institute Of Advanced Industrial & Technology | Axis alignment method and device of energy analyzer |
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