|
JP2587285B2
(ja)
*
|
1989-01-24 |
1997-03-05 |
株式会社荏原製作所 |
可変速給水装置
|
|
JP2004503920A
(ja)
|
2000-05-31 |
2004-02-05 |
モトローラ・インコーポレイテッド |
半導体デバイスおよび該半導体デバイスを製造する方法
|
|
AU2001277001A1
(en)
|
2000-07-24 |
2002-02-05 |
Motorola, Inc. |
Heterojunction tunneling diodes and process for fabricating same
|
|
US20020096683A1
(en)
|
2001-01-19 |
2002-07-25 |
Motorola, Inc. |
Structure and method for fabricating GaN devices utilizing the formation of a compliant substrate
|
|
WO2002082551A1
(en)
|
2001-04-02 |
2002-10-17 |
Motorola, Inc. |
A semiconductor structure exhibiting reduced leakage current
|
|
US6992321B2
(en)
|
2001-07-13 |
2006-01-31 |
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Structure and method for fabricating semiconductor structures and devices utilizing piezoelectric materials
|
|
US7019332B2
(en)
|
2001-07-20 |
2006-03-28 |
Freescale Semiconductor, Inc. |
Fabrication of a wavelength locker within a semiconductor structure
|
|
US6855992B2
(en)
|
2001-07-24 |
2005-02-15 |
Motorola Inc. |
Structure and method for fabricating configurable transistor devices utilizing the formation of a compliant substrate for materials used to form the same
|
|
US20030034491A1
(en)
|
2001-08-14 |
2003-02-20 |
Motorola, Inc. |
Structure and method for fabricating semiconductor structures and devices for detecting an object
|
|
US20030071327A1
(en)
|
2001-10-17 |
2003-04-17 |
Motorola, Inc. |
Method and apparatus utilizing monocrystalline insulator
|
|
US6916717B2
(en)
|
2002-05-03 |
2005-07-12 |
Motorola, Inc. |
Method for growing a monocrystalline oxide layer and for fabricating a semiconductor device on a monocrystalline substrate
|
|
US7169619B2
(en)
|
2002-11-19 |
2007-01-30 |
Freescale Semiconductor, Inc. |
Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process
|
|
US6885065B2
(en)
|
2002-11-20 |
2005-04-26 |
Freescale Semiconductor, Inc. |
Ferromagnetic semiconductor structure and method for forming the same
|
|
US7020374B2
(en)
|
2003-02-03 |
2006-03-28 |
Freescale Semiconductor, Inc. |
Optical waveguide structure and method for fabricating the same
|
|
US6965128B2
(en)
|
2003-02-03 |
2005-11-15 |
Freescale Semiconductor, Inc. |
Structure and method for fabricating semiconductor microresonator devices
|