JPS5310848B2 - - Google Patents
Info
- Publication number
- JPS5310848B2 JPS5310848B2 JP1110372A JP1110372A JPS5310848B2 JP S5310848 B2 JPS5310848 B2 JP S5310848B2 JP 1110372 A JP1110372 A JP 1110372A JP 1110372 A JP1110372 A JP 1110372A JP S5310848 B2 JPS5310848 B2 JP S5310848B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1110372A JPS5310848B2 (zh) | 1972-01-31 | 1972-01-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1110372A JPS5310848B2 (zh) | 1972-01-31 | 1972-01-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4880019A JPS4880019A (zh) | 1973-10-26 |
| JPS5310848B2 true JPS5310848B2 (zh) | 1978-04-17 |
Family
ID=11768662
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1110372A Expired JPS5310848B2 (zh) | 1972-01-31 | 1972-01-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5310848B2 (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170113539A (ko) | 2015-02-12 | 2017-10-12 | 가부시키가이샤 후지미인코퍼레이티드 | 실리콘 웨이퍼의 연마 방법 및 표면 처리 조성물 |
-
1972
- 1972-01-31 JP JP1110372A patent/JPS5310848B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170113539A (ko) | 2015-02-12 | 2017-10-12 | 가부시키가이샤 후지미인코퍼레이티드 | 실리콘 웨이퍼의 연마 방법 및 표면 처리 조성물 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4880019A (zh) | 1973-10-26 |