JPS5310429B1 - - Google Patents
Info
- Publication number
- JPS5310429B1 JPS5310429B1 JP9522276A JP9522276A JPS5310429B1 JP S5310429 B1 JPS5310429 B1 JP S5310429B1 JP 9522276 A JP9522276 A JP 9522276A JP 9522276 A JP9522276 A JP 9522276A JP S5310429 B1 JPS5310429 B1 JP S5310429B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1446—Devices controlled by radiation in a repetitive configuration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/36—Photoelectric screens; Charge-storage screens
- H01J29/39—Charge-storage screens
- H01J29/45—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen
- H01J29/451—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions
- H01J29/453—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions provided with diode arrays
- H01J29/455—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions provided with diode arrays formed on a silicon substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/233—Manufacture of photoelectric screens or charge-storage screens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86086569A | 1969-09-25 | 1969-09-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5310429B1 true JPS5310429B1 (ja) | 1978-04-13 |
Family
ID=25334219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9522276A Pending JPS5310429B1 (ja) | 1969-09-25 | 1976-08-09 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3615449A (ja) |
JP (1) | JPS5310429B1 (ja) |
DE (1) | DE2047316C3 (ja) |
FR (1) | FR2062602A5 (ja) |
GB (1) | GB1307257A (ja) |
NL (1) | NL7014102A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54138016U (ja) * | 1978-03-18 | 1979-09-25 | ||
JPS54137932U (ja) * | 1978-03-15 | 1979-09-25 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT939738B (it) * | 1970-08-12 | 1973-02-10 | Rank Organisation Ltd | Dispositivo di illuminazione per la stampa fotolitografica dei componenti di microcircuiti |
DE2116713B2 (de) * | 1971-04-06 | 1974-03-28 | Ibm Deutschland Gmbh, 7000 Stuttgart | Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung |
US3697178A (en) * | 1971-11-01 | 1972-10-10 | Rca Corp | Method of projection printing photoresist masking layers, including elimination of spurious diffraction-associated patterns from the print |
US4231820A (en) * | 1979-02-21 | 1980-11-04 | Rca Corporation | Method of making a silicon diode array target |
US4360586A (en) * | 1979-05-29 | 1982-11-23 | Massachusetts Institute Of Technology | Spatial period division exposing |
FR2465255B1 (fr) * | 1979-09-10 | 1987-02-20 | Roumiguieres Jean Louis | Procede pour reporter sur un support l'ombre fidele d'un masque perce de fentes distribuees periodiquement, et application de ce procede notamment en photolithogravure |
DE3212393A1 (de) * | 1982-04-02 | 1983-10-13 | Karl Süss KG, Präzisionsgeräte für Wissenschaft und Industrie - GmbH & Co, 8046 Garching | Verfahren zur interferenzverschmierung sowie ausrichtverfahren und -vorrichtung |
DE3315665A1 (de) * | 1983-04-29 | 1984-10-31 | Siemens AG, 1000 Berlin und 8000 München | Herstellung von galvanoplastischen flachteilen mit totationsunsymmetrischen, kegelfoermigen strukturen |
GB8615908D0 (en) * | 1986-06-30 | 1986-08-06 | Hugle W B | Integrated circuits |
US5264957A (en) * | 1992-07-02 | 1993-11-23 | The United States Of America As Represented By The Secretary Of The Air Force | Electrically controlled multiple dispersion (zoom) device |
GB2289771B (en) * | 1994-05-26 | 1997-07-30 | Northern Telecom Ltd | Forming Bragg gratings in photosensitive waveguides |
DE19810055A1 (de) * | 1998-03-09 | 1999-09-23 | Suess Kg Karl | Verfahren zur Nahfeldbelichtung mit im wesentlichen parallelem Licht |
US6096458A (en) * | 1998-08-05 | 2000-08-01 | International Business Machines Corporation | Methods for manufacturing photolithography masks utilizing interfering beams of radiation |
US8841046B2 (en) * | 2004-10-22 | 2014-09-23 | Eulitha Ag | System and a method for generating periodic and/or quasi-periodic pattern on a sample |
US20140092384A1 (en) * | 2011-05-19 | 2014-04-03 | Hitachi High-Technologies Corporation | Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method |
US11042098B2 (en) * | 2019-02-15 | 2021-06-22 | Applied Materials, Inc. | Large area high resolution feature reduction lithography technique |
-
1969
- 1969-09-25 US US860865A patent/US3615449A/en not_active Expired - Lifetime
-
1970
- 1970-09-23 GB GB4526570A patent/GB1307257A/en not_active Expired
- 1970-09-24 NL NL7014102A patent/NL7014102A/xx not_active Application Discontinuation
- 1970-09-24 FR FR7034629A patent/FR2062602A5/fr not_active Expired
- 1970-09-25 DE DE2047316A patent/DE2047316C3/de not_active Expired
-
1976
- 1976-08-09 JP JP9522276A patent/JPS5310429B1/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54137932U (ja) * | 1978-03-15 | 1979-09-25 | ||
JPS54138016U (ja) * | 1978-03-18 | 1979-09-25 |
Also Published As
Publication number | Publication date |
---|---|
DE2047316B2 (ja) | 1978-08-17 |
GB1307257A (en) | 1973-02-14 |
US3615449A (en) | 1971-10-26 |
NL7014102A (ja) | 1971-03-29 |
DE2047316C3 (de) | 1979-04-19 |
FR2062602A5 (ja) | 1971-06-25 |
DE2047316A1 (de) | 1971-05-06 |