JPS5277840A - Device for chemical dry etching - Google Patents
Device for chemical dry etchingInfo
- Publication number
- JPS5277840A JPS5277840A JP15444475A JP15444475A JPS5277840A JP S5277840 A JPS5277840 A JP S5277840A JP 15444475 A JP15444475 A JP 15444475A JP 15444475 A JP15444475 A JP 15444475A JP S5277840 A JPS5277840 A JP S5277840A
- Authority
- JP
- Japan
- Prior art keywords
- dry etching
- chemical dry
- chemical
- etching
- dry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001312 dry etching Methods 0.000 title 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15444475A JPS5277840A (en) | 1975-12-24 | 1975-12-24 | Device for chemical dry etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15444475A JPS5277840A (en) | 1975-12-24 | 1975-12-24 | Device for chemical dry etching |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5277840A true JPS5277840A (en) | 1977-06-30 |
| JPS5550114B2 JPS5550114B2 (cs) | 1980-12-16 |
Family
ID=15584329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15444475A Granted JPS5277840A (en) | 1975-12-24 | 1975-12-24 | Device for chemical dry etching |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5277840A (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5651828A (en) * | 1979-09-28 | 1981-05-09 | Ibm | Method and device for forming field for uniform gaseous molecule |
| JPS5776188A (en) * | 1980-10-29 | 1982-05-13 | Fujitsu Ltd | Gas plasma etching device |
| JPS6394628A (ja) * | 1986-10-09 | 1988-04-25 | Tokuda Seisakusho Ltd | ドライエツチング装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4921340A (cs) * | 1972-06-17 | 1974-02-25 |
-
1975
- 1975-12-24 JP JP15444475A patent/JPS5277840A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4921340A (cs) * | 1972-06-17 | 1974-02-25 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5651828A (en) * | 1979-09-28 | 1981-05-09 | Ibm | Method and device for forming field for uniform gaseous molecule |
| JPS5776188A (en) * | 1980-10-29 | 1982-05-13 | Fujitsu Ltd | Gas plasma etching device |
| JPS6394628A (ja) * | 1986-10-09 | 1988-04-25 | Tokuda Seisakusho Ltd | ドライエツチング装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5550114B2 (cs) | 1980-12-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ZA761431B (en) | Selective chemical sensitive devices | |
| JPS5245288A (en) | Semiconductor device | |
| JPS51117880A (en) | Semiconductor device | |
| JPS527678A (en) | Semiconductor device | |
| JPS5216990A (en) | Semiconductor device | |
| JPS5217772A (en) | Semiconductor device | |
| GB1542651A (en) | Semiconductor devices | |
| ZA766145B (en) | Semiconductor devices | |
| GB1558349A (en) | Making semiconductor device | |
| JPS5279661A (en) | Semiconductor device | |
| GB1553417A (en) | Semiconductor device manufacture | |
| GB1552161A (en) | Semiconductor devices | |
| GB1555037A (en) | Etching processes | |
| JPS5238892A (en) | Semiconductor device | |
| JPS5234676A (en) | Semiconductor device | |
| GB1554273A (en) | Semiconductor device manufacture | |
| JPS52119068A (en) | Semiconductor device | |
| JPS529380A (en) | Semiconductor device | |
| JPS51145992A (en) | Operating device | |
| JPS526472A (en) | Semiconductor device | |
| JPS57141970A (en) | Semiconductor device | |
| GB1540461A (en) | Chemical processes | |
| JPS5277840A (en) | Device for chemical dry etching | |
| JPS51117884A (en) | Semiconductor device | |
| JPS5276876A (en) | Semiconductor device |