JPS5277840A - Device for chemical dry etching - Google Patents

Device for chemical dry etching

Info

Publication number
JPS5277840A
JPS5277840A JP15444475A JP15444475A JPS5277840A JP S5277840 A JPS5277840 A JP S5277840A JP 15444475 A JP15444475 A JP 15444475A JP 15444475 A JP15444475 A JP 15444475A JP S5277840 A JPS5277840 A JP S5277840A
Authority
JP
Japan
Prior art keywords
dry etching
chemical dry
chemical
etching
dry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15444475A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5550114B2 (cs
Inventor
Yoshio Murakami
Masahiro Shibagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP15444475A priority Critical patent/JPS5277840A/ja
Publication of JPS5277840A publication Critical patent/JPS5277840A/ja
Publication of JPS5550114B2 publication Critical patent/JPS5550114B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP15444475A 1975-12-24 1975-12-24 Device for chemical dry etching Granted JPS5277840A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15444475A JPS5277840A (en) 1975-12-24 1975-12-24 Device for chemical dry etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15444475A JPS5277840A (en) 1975-12-24 1975-12-24 Device for chemical dry etching

Publications (2)

Publication Number Publication Date
JPS5277840A true JPS5277840A (en) 1977-06-30
JPS5550114B2 JPS5550114B2 (cs) 1980-12-16

Family

ID=15584329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15444475A Granted JPS5277840A (en) 1975-12-24 1975-12-24 Device for chemical dry etching

Country Status (1)

Country Link
JP (1) JPS5277840A (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5651828A (en) * 1979-09-28 1981-05-09 Ibm Method and device for forming field for uniform gaseous molecule
JPS5776188A (en) * 1980-10-29 1982-05-13 Fujitsu Ltd Gas plasma etching device
JPS6394628A (ja) * 1986-10-09 1988-04-25 Tokuda Seisakusho Ltd ドライエツチング装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921340A (cs) * 1972-06-17 1974-02-25

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4921340A (cs) * 1972-06-17 1974-02-25

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5651828A (en) * 1979-09-28 1981-05-09 Ibm Method and device for forming field for uniform gaseous molecule
JPS5776188A (en) * 1980-10-29 1982-05-13 Fujitsu Ltd Gas plasma etching device
JPS6394628A (ja) * 1986-10-09 1988-04-25 Tokuda Seisakusho Ltd ドライエツチング装置

Also Published As

Publication number Publication date
JPS5550114B2 (cs) 1980-12-16

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