JPS5277673A - Apparatus for treating pieces under treatment under pressureereduced condition - Google Patents

Apparatus for treating pieces under treatment under pressureereduced condition

Info

Publication number
JPS5277673A
JPS5277673A JP51144072A JP14407276A JPS5277673A JP S5277673 A JPS5277673 A JP S5277673A JP 51144072 A JP51144072 A JP 51144072A JP 14407276 A JP14407276 A JP 14407276A JP S5277673 A JPS5277673 A JP S5277673A
Authority
JP
Japan
Prior art keywords
pressureereduced
condition
under
treating pieces
treatment under
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP51144072A
Other languages
English (en)
Japanese (ja)
Other versions
JPS541551B2 (Direct
Inventor
Rorentsu Arunto Jiyun Haabaato
Robaato Kuranitsuku Jiyon
Boruderesu Deimetoriosu
Jiyon Ruukasu Chiyaaruzu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5277673A publication Critical patent/JPS5277673A/ja
Publication of JPS541551B2 publication Critical patent/JPS541551B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP51144072A 1975-12-22 1976-12-02 Apparatus for treating pieces under treatment under pressureereduced condition Granted JPS5277673A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/643,221 US3983402A (en) 1975-12-22 1975-12-22 Ion implantation apparatus

Publications (2)

Publication Number Publication Date
JPS5277673A true JPS5277673A (en) 1977-06-30
JPS541551B2 JPS541551B2 (Direct) 1979-01-25

Family

ID=24579887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51144072A Granted JPS5277673A (en) 1975-12-22 1976-12-02 Apparatus for treating pieces under treatment under pressureereduced condition

Country Status (6)

Country Link
US (1) US3983402A (Direct)
JP (1) JPS5277673A (Direct)
CA (1) CA1057422A (Direct)
FR (1) FR2336794A1 (Direct)
GB (1) GB1513487A (Direct)
IT (1) IT1074004B (Direct)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61114456A (ja) * 1985-11-01 1986-06-02 Hitachi Ltd イオン打込装置

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2557685A1 (de) * 1975-12-20 1977-06-30 Ibm Deutschland Verfahren zur herstellung einer gerasterten photoleiterschicht
US4149084A (en) * 1977-11-01 1979-04-10 International Business Machines Corporation Apparatus for maintaining ion bombardment beam under improved vacuum condition
DD158974A2 (de) * 1979-09-28 1983-02-09 Guyenot Ernst Doppelschleuse fuer korpuskularstrahlgeraete
GB2052146B (en) * 1979-06-04 1983-06-22 Varian Associates Unitary electromagnet for double deflection scanning of charged particle beam
IT1165685B (it) * 1979-06-12 1987-04-22 Agusta Aeronaut Costr Procedimento e dispositivo per il montaggio di pezzi all interno di una camera sotto vuoto di un micorscopio elettronico
US4247781A (en) * 1979-06-29 1981-01-27 International Business Machines Corporation Cooled target disc for high current ion implantation method and apparatus
US4346301A (en) * 1979-07-30 1982-08-24 Hughes Aircraft Company Ion implantation system
US4258266A (en) * 1979-07-30 1981-03-24 Hughes Aircraft Company Ion implantation system
US4276477A (en) * 1979-09-17 1981-06-30 Varian Associates, Inc. Focusing apparatus for uniform application of charged particle beam
JPS5953659B2 (ja) * 1980-04-11 1984-12-26 株式会社日立製作所 真空室中回転体の往復動機構
US4462580A (en) * 1981-10-02 1984-07-31 At&T Bell Laboratories Hydraulically driven X-Y stage
US4504194A (en) * 1982-05-24 1985-03-12 Varian Associates, Inc. Air lock vacuum pumping methods and apparatus
US4899059A (en) * 1988-05-18 1990-02-06 Varian Associates, Inc. Disk scanning apparatus for batch ion implanters
EP0342933B1 (en) * 1988-05-18 1996-09-18 Varian Associates, Inc. Disk scanning apparatus for batch ion implanters
US4965862A (en) * 1988-05-18 1990-10-23 Varian Associates, Inc. Disk scanning apparatus for batch ion implanters
JPH04112441A (ja) * 1990-08-31 1992-04-14 Toshiba Corp イオン注入装置及びそのクリーニング方法
JPH0619519U (ja) * 1992-04-01 1994-03-15 下村工業株式会社 靴の型崩れ防止具
US5672882A (en) * 1995-12-29 1997-09-30 Advanced Micro Devices, Inc. Ion implantation device with a closed-loop process chamber pressure control system
US6065499A (en) * 1998-12-21 2000-05-23 Eaton Corporation Lateral stress relief mechanism for vacuum bellows
CN111364026B (zh) * 2020-05-27 2020-08-14 上海陛通半导体能源科技股份有限公司 往复式旋转cvd设备及应用方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2220973A (en) * 1939-03-31 1940-11-12 Rca Corp Electron microscope
US2440067A (en) * 1945-11-10 1948-04-20 Gen Electric Manipulator
US2627580A (en) * 1948-10-23 1953-02-03 Rca Corp Demountable vacuumtight seal
US3857041A (en) * 1969-07-03 1974-12-24 Texas Instruments Inc Electron beam patterning system for use in production of semiconductor devices
US3778626A (en) * 1972-07-28 1973-12-11 Western Electric Co Mechanical scan system for ion implantation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61114456A (ja) * 1985-11-01 1986-06-02 Hitachi Ltd イオン打込装置

Also Published As

Publication number Publication date
CA1057422A (en) 1979-06-26
JPS541551B2 (Direct) 1979-01-25
GB1513487A (en) 1978-06-07
US3983402A (en) 1976-09-28
FR2336794B1 (Direct) 1979-09-28
FR2336794A1 (fr) 1977-07-22
IT1074004B (it) 1985-04-17

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