JPS5243692B2 - - Google Patents
Info
- Publication number
- JPS5243692B2 JPS5243692B2 JP48033605A JP3360573A JPS5243692B2 JP S5243692 B2 JPS5243692 B2 JP S5243692B2 JP 48033605 A JP48033605 A JP 48033605A JP 3360573 A JP3360573 A JP 3360573A JP S5243692 B2 JPS5243692 B2 JP S5243692B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48033605A JPS5243692B2 (enExample) | 1973-03-26 | 1973-03-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP48033605A JPS5243692B2 (enExample) | 1973-03-26 | 1973-03-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS49122756A JPS49122756A (enExample) | 1974-11-25 |
| JPS5243692B2 true JPS5243692B2 (enExample) | 1977-11-01 |
Family
ID=12391092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP48033605A Expired JPS5243692B2 (enExample) | 1973-03-26 | 1973-03-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5243692B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5328556Y2 (enExample) * | 1974-12-06 | 1978-07-18 | ||
| JPS5252579A (en) * | 1975-10-27 | 1977-04-27 | Canon Inc | Clearance adjusng method |
| JPS5381569U (enExample) * | 1976-12-09 | 1978-07-06 | ||
| US4472824A (en) * | 1982-08-04 | 1984-09-18 | The Perkin-Elmer Corporation | Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography |
| JPH0722107B2 (ja) * | 1986-02-10 | 1995-03-08 | 株式会社ニコン | 露光装置 |
| JPH0628222B2 (ja) * | 1986-05-28 | 1994-04-13 | 株式会社日立製作所 | プロキシミテイ方式の露光装置 |
-
1973
- 1973-03-26 JP JP48033605A patent/JPS5243692B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS49122756A (enExample) | 1974-11-25 |