JPS5235720B2 - - Google Patents
Info
- Publication number
- JPS5235720B2 JPS5235720B2 JP8372371A JP8372371A JPS5235720B2 JP S5235720 B2 JPS5235720 B2 JP S5235720B2 JP 8372371 A JP8372371 A JP 8372371A JP 8372371 A JP8372371 A JP 8372371A JP S5235720 B2 JPS5235720 B2 JP S5235720B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8372371A JPS5235720B2 (enrdf_load_stackoverflow) | 1971-10-22 | 1971-10-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8372371A JPS5235720B2 (enrdf_load_stackoverflow) | 1971-10-22 | 1971-10-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4848000A JPS4848000A (enrdf_load_stackoverflow) | 1973-07-07 |
| JPS5235720B2 true JPS5235720B2 (enrdf_load_stackoverflow) | 1977-09-10 |
Family
ID=13810420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8372371A Expired JPS5235720B2 (enrdf_load_stackoverflow) | 1971-10-22 | 1971-10-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5235720B2 (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0164598A3 (en) * | 1984-05-14 | 1986-11-20 | Nippon Telegraph And Telephone Public Corporation | Photosensitive resin composition and process for forming photo-resist pattern using the same |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4576999A (en) * | 1982-05-06 | 1986-03-18 | General Electric Company | Ultraviolet radiation-curable silicone release compositions with epoxy and/or acrylic functionality |
| WO2009099099A1 (ja) * | 2008-02-07 | 2009-08-13 | Nippon Steel Chemical Co., Ltd. | シリコーン樹脂及びその製造方法並びにこのシリコーン樹脂を含んだ硬化型樹脂組成物 |
| EP4034588A1 (de) * | 2019-09-27 | 2022-08-03 | Evonik Operations GmbH | Silikon(meth)acrylate, verfahren zu ihrer herstellung und ihre verwendung in härtbaren zusammensetzungen |
-
1971
- 1971-10-22 JP JP8372371A patent/JPS5235720B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0164598A3 (en) * | 1984-05-14 | 1986-11-20 | Nippon Telegraph And Telephone Public Corporation | Photosensitive resin composition and process for forming photo-resist pattern using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4848000A (enrdf_load_stackoverflow) | 1973-07-07 |