JPS5234965B1 - - Google Patents
Info
- Publication number
- JPS5234965B1 JPS5234965B1 JP46061711A JP6171171A JPS5234965B1 JP S5234965 B1 JPS5234965 B1 JP S5234965B1 JP 46061711 A JP46061711 A JP 46061711A JP 6171171 A JP6171171 A JP 6171171A JP S5234965 B1 JPS5234965 B1 JP S5234965B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/128—Radiation-activated cross-linking agent containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6856770A | 1970-08-31 | 1970-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5234965B1 true JPS5234965B1 (OSRAM) | 1977-09-06 |
Family
ID=22083371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46061711A Pending JPS5234965B1 (OSRAM) | 1970-08-31 | 1971-08-16 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3644118A (OSRAM) |
| JP (1) | JPS5234965B1 (OSRAM) |
| DE (1) | DE2143430A1 (OSRAM) |
| FR (1) | FR2103623B1 (OSRAM) |
| GB (1) | GB1361272A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60167219A (ja) * | 1984-02-09 | 1985-08-30 | ソ−ド株式会社 | 水銀スイツチ |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3885963A (en) * | 1972-04-18 | 1975-05-27 | Xerox Corp | Light activating imaging process |
| JPS5024641B2 (OSRAM) * | 1972-10-17 | 1975-08-18 | ||
| US3859099A (en) * | 1972-12-22 | 1975-01-07 | Eastman Kodak Co | Positive plate incorporating diazoquinone |
| US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
| US3986874A (en) * | 1974-10-23 | 1976-10-19 | Xerox Corporation | Driographic imaging method |
| EP0199303B1 (en) * | 1985-04-18 | 1992-06-24 | Oki Electric Industry Company, Limited | Method of forming a photoresist pattern |
| JPS6210104A (ja) * | 1985-07-05 | 1987-01-19 | Nitto Boseki Co Ltd | 新規な感光性樹脂の製造方法 |
| US4758497A (en) * | 1985-08-22 | 1988-07-19 | Polychrome Corporation | Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds |
| KR101222947B1 (ko) | 2005-06-30 | 2013-01-17 | 엘지디스플레이 주식회사 | 인쇄용 용제, 및 그를 이용한 인쇄용 패턴 조성물 및 패턴 형성방법 |
-
1970
- 1970-08-31 US US68567A patent/US3644118A/en not_active Expired - Lifetime
-
1971
- 1971-06-22 FR FR7123173A patent/FR2103623B1/fr not_active Expired
- 1971-07-05 GB GB3135571A patent/GB1361272A/en not_active Expired
- 1971-08-16 JP JP46061711A patent/JPS5234965B1/ja active Pending
- 1971-08-30 DE DE19712143430 patent/DE2143430A1/de active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60167219A (ja) * | 1984-02-09 | 1985-08-30 | ソ−ド株式会社 | 水銀スイツチ |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1361272A (en) | 1974-07-24 |
| US3644118A (en) | 1972-02-22 |
| FR2103623A1 (OSRAM) | 1972-04-14 |
| DE2143430A1 (de) | 1972-03-09 |
| FR2103623B1 (OSRAM) | 1974-04-12 |