JPS5226215A - Photosensitive hardenable composition - Google Patents

Photosensitive hardenable composition

Info

Publication number
JPS5226215A
JPS5226215A JP10181775A JP10181775A JPS5226215A JP S5226215 A JPS5226215 A JP S5226215A JP 10181775 A JP10181775 A JP 10181775A JP 10181775 A JP10181775 A JP 10181775A JP S5226215 A JPS5226215 A JP S5226215A
Authority
JP
Japan
Prior art keywords
hardenable composition
photosensitive
photosensitive hardenable
specific
developable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10181775A
Other languages
Japanese (ja)
Inventor
Tetsuo Higuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Priority to JP10181775A priority Critical patent/JPS5226215A/en
Priority to US05/646,012 priority patent/US4092172A/en
Publication of JPS5226215A publication Critical patent/JPS5226215A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F255/00Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F267/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group C08F22/00
    • C08F267/06Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated polycarboxylic acids or derivatives thereof as defined in group C08F22/00 on to polymers of esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04Polyurethanes
    • C08L75/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C08L75/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE:To provide an image formation material consisting of a specific copolymer, a specific vinyl urethane compound, and a sensitizer, developable by basic water and having superior characteristics.
JP10181775A 1975-08-22 1975-08-22 Photosensitive hardenable composition Pending JPS5226215A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10181775A JPS5226215A (en) 1975-08-22 1975-08-22 Photosensitive hardenable composition
US05/646,012 US4092172A (en) 1975-08-22 1976-01-02 Photocurable composition comprising a copolymer of a maleic acid monoester with an α-olefine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10181775A JPS5226215A (en) 1975-08-22 1975-08-22 Photosensitive hardenable composition

Publications (1)

Publication Number Publication Date
JPS5226215A true JPS5226215A (en) 1977-02-26

Family

ID=14310665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10181775A Pending JPS5226215A (en) 1975-08-22 1975-08-22 Photosensitive hardenable composition

Country Status (1)

Country Link
JP (1) JPS5226215A (en)

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