JPS5220101A - Phenollless photooresist peeling agent - Google Patents

Phenollless photooresist peeling agent

Info

Publication number
JPS5220101A
JPS5220101A JP9087276A JP9087276A JPS5220101A JP S5220101 A JPS5220101 A JP S5220101A JP 9087276 A JP9087276 A JP 9087276A JP 9087276 A JP9087276 A JP 9087276A JP S5220101 A JPS5220101 A JP S5220101A
Authority
JP
Japan
Prior art keywords
photooresist
phenollless
peeling agent
peeling
agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9087276A
Other languages
English (en)
Japanese (ja)
Inventor
Ii Banda Mei Jiyoon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical Corp filed Critical Allied Chemical Corp
Publication of JPS5220101A publication Critical patent/JPS5220101A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP9087276A 1975-08-01 1976-07-31 Phenollless photooresist peeling agent Pending JPS5220101A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60157475A 1975-08-01 1975-08-01

Publications (1)

Publication Number Publication Date
JPS5220101A true JPS5220101A (en) 1977-02-15

Family

ID=24408019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9087276A Pending JPS5220101A (en) 1975-08-01 1976-07-31 Phenollless photooresist peeling agent

Country Status (6)

Country Link
JP (1) JPS5220101A (cs)
CA (1) CA1074219A (cs)
DE (1) DE2632949A1 (cs)
FR (1) FR2319396A1 (cs)
GB (1) GB1551143A (cs)
IT (1) IT1125196B (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153577A (en) * 1978-05-22 1979-12-03 Allied Chem Photoresist separator containing no phenol and chlorinated hydrocarbon
JPH02251855A (ja) * 1988-11-18 1990-10-09 Internatl Business Mach Corp <Ibm> ホトレシスト剥離用組成物および剥離方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4242218A (en) * 1976-11-08 1980-12-30 Allied Chemical Corporation Phenol-free photoresist stripper
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
JPH0212154A (ja) * 1988-04-13 1990-01-17 Siemens Ag 金属伝導層上のフオトレジスト層の除去方法
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153577A (en) * 1978-05-22 1979-12-03 Allied Chem Photoresist separator containing no phenol and chlorinated hydrocarbon
JPH02251855A (ja) * 1988-11-18 1990-10-09 Internatl Business Mach Corp <Ibm> ホトレシスト剥離用組成物および剥離方法

Also Published As

Publication number Publication date
FR2319396B1 (cs) 1980-03-14
CA1074219A (en) 1980-03-25
GB1551143A (en) 1979-08-22
DE2632949A1 (de) 1977-02-17
DE2632949C2 (cs) 1987-11-19
IT1125196B (it) 1986-05-14
FR2319396A1 (fr) 1977-02-25

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