JPS52147073A - Ion implantation apparatus - Google Patents

Ion implantation apparatus

Info

Publication number
JPS52147073A
JPS52147073A JP6361576A JP6361576A JPS52147073A JP S52147073 A JPS52147073 A JP S52147073A JP 6361576 A JP6361576 A JP 6361576A JP 6361576 A JP6361576 A JP 6361576A JP S52147073 A JPS52147073 A JP S52147073A
Authority
JP
Japan
Prior art keywords
ion implantation
implantation apparatus
implantation
becomes
low energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6361576A
Other languages
Japanese (ja)
Other versions
JPS5853469B2 (en
Inventor
Katsumi Tokikuchi
Kuniyuki Sakumichi
Hideki Koike
Ichiro Shikamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6361576A priority Critical patent/JPS5853469B2/en
Publication of JPS52147073A publication Critical patent/JPS52147073A/en
Publication of JPS5853469B2 publication Critical patent/JPS5853469B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To accurately determine the total quantity of implantation by indirectly estimating the quantity of sputtering neutral particles which becomes a problem at the time of low energy implantation.
COPYRIGHT: (C)1977,JPO&Japio
JP6361576A 1976-06-02 1976-06-02 Ion implantation device Expired JPS5853469B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6361576A JPS5853469B2 (en) 1976-06-02 1976-06-02 Ion implantation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6361576A JPS5853469B2 (en) 1976-06-02 1976-06-02 Ion implantation device

Publications (2)

Publication Number Publication Date
JPS52147073A true JPS52147073A (en) 1977-12-07
JPS5853469B2 JPS5853469B2 (en) 1983-11-29

Family

ID=13234380

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6361576A Expired JPS5853469B2 (en) 1976-06-02 1976-06-02 Ion implantation device

Country Status (1)

Country Link
JP (1) JPS5853469B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55124936A (en) * 1979-03-22 1980-09-26 Hitachi Ltd Control method of beam current in ion drive
JPS5750759A (en) * 1980-09-10 1982-03-25 Hitachi Ltd Charged particle irradiator

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0234755Y2 (en) * 1984-09-06 1990-09-19

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55124936A (en) * 1979-03-22 1980-09-26 Hitachi Ltd Control method of beam current in ion drive
JPS5750759A (en) * 1980-09-10 1982-03-25 Hitachi Ltd Charged particle irradiator

Also Published As

Publication number Publication date
JPS5853469B2 (en) 1983-11-29

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