Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KKfiledCriticalSeiko Epson Corp
Priority to JP4405576ApriorityCriticalpatent/JPS52127254A/en
Publication of JPS52127254ApublicationCriticalpatent/JPS52127254A/en
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Abstract
PURPOSE: To improve the quality of drawings in such a way that the width of a photographed line is made constant for a figure of any shape, by controlling the light quantity from a photohead of an optical drawing equipment according to the movement direction.
COPYRIGHT: (C)1977,JPO&Japio
JP4405576A1976-04-161976-04-16Photohead control device
PendingJPS52127254A
(en)