JPS52121152U - - Google Patents
Info
- Publication number
- JPS52121152U JPS52121152U JP2951676U JP2951676U JPS52121152U JP S52121152 U JPS52121152 U JP S52121152U JP 2951676 U JP2951676 U JP 2951676U JP 2951676 U JP2951676 U JP 2951676U JP S52121152 U JPS52121152 U JP S52121152U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Other Air-Conditioning Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2951676U JPS565025Y2 (enExample) | 1976-03-11 | 1976-03-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2951676U JPS565025Y2 (enExample) | 1976-03-11 | 1976-03-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52121152U true JPS52121152U (enExample) | 1977-09-14 |
| JPS565025Y2 JPS565025Y2 (enExample) | 1981-02-03 |
Family
ID=28489104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2951676U Expired JPS565025Y2 (enExample) | 1976-03-11 | 1976-03-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS565025Y2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0166549A2 (en) * | 1984-06-21 | 1986-01-02 | Varian Associates, Inc. | Method for proximity effect correction in electron beam lithography systems |
| JPH0715876B2 (ja) * | 1985-07-03 | 1995-02-22 | 株式会社ニコン | 露光方法及びフォトリソグラフィ装置 |
| WO2021255895A1 (ja) * | 2020-06-18 | 2021-12-23 | 三菱電機ビルテクノサービス株式会社 | 冷媒回収システム及び冷媒回収方法 |
-
1976
- 1976-03-11 JP JP2951676U patent/JPS565025Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS565025Y2 (enExample) | 1981-02-03 |