JPS52109882A - Manufacture for semiconductor device - Google Patents

Manufacture for semiconductor device

Info

Publication number
JPS52109882A
JPS52109882A JP9157176A JP9157176A JPS52109882A JP S52109882 A JPS52109882 A JP S52109882A JP 9157176 A JP9157176 A JP 9157176A JP 9157176 A JP9157176 A JP 9157176A JP S52109882 A JPS52109882 A JP S52109882A
Authority
JP
Japan
Prior art keywords
semiconductor device
manufacture
domain
oxiding
built
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9157176A
Other languages
Japanese (ja)
Other versions
JPS5938741B2 (en
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP51091571A priority Critical patent/JPS5938741B2/en
Publication of JPS52109882A publication Critical patent/JPS52109882A/en
Publication of JPS5938741B2 publication Critical patent/JPS5938741B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Bipolar Transistors (AREA)
  • Element Separation (AREA)

Abstract

PURPOSE: To enable the channel cut domain between the adjacent semiconductor devices by the use of the photo mask by one time, by forming the built in oxide domain by covering a part of the semiconductor device with W or Mo film and by selectively oxiding other parts.
COPYRIGHT: (C)1977,JPO&Japio
JP51091571A 1976-07-31 1976-07-31 Semiconductor device and its manufacturing method Expired JPS5938741B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51091571A JPS5938741B2 (en) 1976-07-31 1976-07-31 Semiconductor device and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51091571A JPS5938741B2 (en) 1976-07-31 1976-07-31 Semiconductor device and its manufacturing method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3945471A Division JPS5312158B1 (en) 1971-06-05 1971-06-05

Publications (2)

Publication Number Publication Date
JPS52109882A true JPS52109882A (en) 1977-09-14
JPS5938741B2 JPS5938741B2 (en) 1984-09-19

Family

ID=14030204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51091571A Expired JPS5938741B2 (en) 1976-07-31 1976-07-31 Semiconductor device and its manufacturing method

Country Status (1)

Country Link
JP (1) JPS5938741B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1549386A (en) * 1966-10-05 1968-12-13
JPS4917069A (en) * 1972-06-10 1974-02-15

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1549386A (en) * 1966-10-05 1968-12-13
JPS4917069A (en) * 1972-06-10 1974-02-15

Also Published As

Publication number Publication date
JPS5938741B2 (en) 1984-09-19

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