JPS52109874A - Photo mask correcting unit - Google Patents
Photo mask correcting unitInfo
- Publication number
- JPS52109874A JPS52109874A JP2618976A JP2618976A JPS52109874A JP S52109874 A JPS52109874 A JP S52109874A JP 2618976 A JP2618976 A JP 2618976A JP 2618976 A JP2618976 A JP 2618976A JP S52109874 A JPS52109874 A JP S52109874A
- Authority
- JP
- Japan
- Prior art keywords
- correcting unit
- photo mask
- mask correcting
- laser light
- prisms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To correct the defects on metallic film larger than the spot diameter of laser light with high speed and good accuracy, by feeding the feed of laser light with the scanning unit consisting of two prisms.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2618976A JPS52109874A (en) | 1976-03-12 | 1976-03-12 | Photo mask correcting unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2618976A JPS52109874A (en) | 1976-03-12 | 1976-03-12 | Photo mask correcting unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52109874A true JPS52109874A (en) | 1977-09-14 |
JPS5334460B2 JPS5334460B2 (en) | 1978-09-20 |
Family
ID=12186543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2618976A Granted JPS52109874A (en) | 1976-03-12 | 1976-03-12 | Photo mask correcting unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52109874A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5527686A (en) * | 1978-08-21 | 1980-02-27 | Sony Corp | Projection eliminating device |
JPS56162748A (en) * | 1980-05-21 | 1981-12-14 | Hitachi Ltd | Defect correcting method for photomask |
JPS5871617A (en) * | 1981-10-23 | 1983-04-28 | Nec Corp | Laser annealing apparatus |
JP2007538243A (en) * | 2004-05-20 | 2007-12-27 | テラビュー リミテッド | Apparatus and method for investigating a sample |
-
1976
- 1976-03-12 JP JP2618976A patent/JPS52109874A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5527686A (en) * | 1978-08-21 | 1980-02-27 | Sony Corp | Projection eliminating device |
JPS56162748A (en) * | 1980-05-21 | 1981-12-14 | Hitachi Ltd | Defect correcting method for photomask |
JPS5871617A (en) * | 1981-10-23 | 1983-04-28 | Nec Corp | Laser annealing apparatus |
JP2007538243A (en) * | 2004-05-20 | 2007-12-27 | テラビュー リミテッド | Apparatus and method for investigating a sample |
US8373126B2 (en) | 2004-05-20 | 2013-02-12 | Teraview Limited | Apparatus and method for investigating a sample |
Also Published As
Publication number | Publication date |
---|---|
JPS5334460B2 (en) | 1978-09-20 |
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