JPS5189387A - - Google Patents
Info
- Publication number
- JPS5189387A JPS5189387A JP50014738A JP1473875A JPS5189387A JP S5189387 A JPS5189387 A JP S5189387A JP 50014738 A JP50014738 A JP 50014738A JP 1473875 A JP1473875 A JP 1473875A JP S5189387 A JPS5189387 A JP S5189387A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50014738A JPS5189387A (en) | 1975-02-03 | 1975-02-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50014738A JPS5189387A (en) | 1975-02-03 | 1975-02-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5189387A true JPS5189387A (en) | 1976-08-05 |
Family
ID=11869451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50014738A Pending JPS5189387A (en) | 1975-02-03 | 1975-02-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5189387A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS538953U (en) * | 1976-07-07 | 1978-01-25 | ||
| JPS5559723A (en) * | 1978-10-27 | 1980-05-06 | Hitachi Ltd | Plasma etching method |
| JPS57137472A (en) * | 1981-02-17 | 1982-08-25 | Nec Corp | Etching method for polycrystalline silicon |
| JPS5928156A (en) * | 1982-12-29 | 1984-02-14 | Konishiroku Photo Ind Co Ltd | Manufacture of exposure mask |
| JPS63199428A (en) * | 1987-02-16 | 1988-08-17 | Nippon Telegr & Teleph Corp <Ntt> | Photo-dry etching device and method |
| JPH01226158A (en) * | 1988-03-07 | 1989-09-08 | Toshiba Corp | Manufacture of semiconductor device |
-
1975
- 1975-02-03 JP JP50014738A patent/JPS5189387A/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS538953U (en) * | 1976-07-07 | 1978-01-25 | ||
| JPS5559723A (en) * | 1978-10-27 | 1980-05-06 | Hitachi Ltd | Plasma etching method |
| JPS57137472A (en) * | 1981-02-17 | 1982-08-25 | Nec Corp | Etching method for polycrystalline silicon |
| JPS5928156A (en) * | 1982-12-29 | 1984-02-14 | Konishiroku Photo Ind Co Ltd | Manufacture of exposure mask |
| JPH0548464B2 (en) * | 1982-12-29 | 1993-07-21 | Konishiroku Photo Ind | |
| JPS63199428A (en) * | 1987-02-16 | 1988-08-17 | Nippon Telegr & Teleph Corp <Ntt> | Photo-dry etching device and method |
| JPH01226158A (en) * | 1988-03-07 | 1989-09-08 | Toshiba Corp | Manufacture of semiconductor device |