JPS5189384A - - Google Patents

Info

Publication number
JPS5189384A
JPS5189384A JP50013335A JP1333575A JPS5189384A JP S5189384 A JPS5189384 A JP S5189384A JP 50013335 A JP50013335 A JP 50013335A JP 1333575 A JP1333575 A JP 1333575A JP S5189384 A JPS5189384 A JP S5189384A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50013335A
Other languages
Japanese (ja)
Other versions
JPS5837388B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP50013335A priority Critical patent/JPS5837388B2/ja
Publication of JPS5189384A publication Critical patent/JPS5189384A/ja
Publication of JPS5837388B2 publication Critical patent/JPS5837388B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP50013335A 1975-02-03 1975-02-03 キソウセイチヨウホウホウ Expired JPS5837388B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50013335A JPS5837388B2 (ja) 1975-02-03 1975-02-03 キソウセイチヨウホウホウ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50013335A JPS5837388B2 (ja) 1975-02-03 1975-02-03 キソウセイチヨウホウホウ

Publications (2)

Publication Number Publication Date
JPS5189384A true JPS5189384A (enrdf_load_html_response) 1976-08-05
JPS5837388B2 JPS5837388B2 (ja) 1983-08-16

Family

ID=11830246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50013335A Expired JPS5837388B2 (ja) 1975-02-03 1975-02-03 キソウセイチヨウホウホウ

Country Status (1)

Country Link
JP (1) JPS5837388B2 (enrdf_load_html_response)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57123969A (en) * 1981-01-26 1982-08-02 Semiconductor Energy Lab Co Ltd Formation of zinc oxide film by vapor phase method using plasma
JPS58158916A (ja) * 1982-03-16 1983-09-21 Fujitsu Ltd 半導体装置の製造方法
JPS58161763A (ja) * 1982-03-17 1983-09-26 Nippon Telegr & Teleph Corp <Ntt> 真空蒸着法
JPS62260065A (ja) * 1986-04-04 1987-11-12 Canon Inc 酸化すず薄膜の形成法
JPS62274072A (ja) * 1986-05-21 1987-11-28 Canon Inc 酸化すず薄膜の改善された形成法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4843581A (enrdf_load_html_response) * 1971-10-04 1973-06-23
JPS496168A (enrdf_load_html_response) * 1972-04-10 1974-01-19

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4843581A (enrdf_load_html_response) * 1971-10-04 1973-06-23
JPS496168A (enrdf_load_html_response) * 1972-04-10 1974-01-19

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57123969A (en) * 1981-01-26 1982-08-02 Semiconductor Energy Lab Co Ltd Formation of zinc oxide film by vapor phase method using plasma
JPS58158916A (ja) * 1982-03-16 1983-09-21 Fujitsu Ltd 半導体装置の製造方法
JPS58161763A (ja) * 1982-03-17 1983-09-26 Nippon Telegr & Teleph Corp <Ntt> 真空蒸着法
JPS62260065A (ja) * 1986-04-04 1987-11-12 Canon Inc 酸化すず薄膜の形成法
JPS62274072A (ja) * 1986-05-21 1987-11-28 Canon Inc 酸化すず薄膜の改善された形成法

Also Published As

Publication number Publication date
JPS5837388B2 (ja) 1983-08-16

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