JPS5184580A - Gasuetsuchingusochi - Google Patents

Gasuetsuchingusochi

Info

Publication number
JPS5184580A
JPS5184580A JP864275A JP864275A JPS5184580A JP S5184580 A JPS5184580 A JP S5184580A JP 864275 A JP864275 A JP 864275A JP 864275 A JP864275 A JP 864275A JP S5184580 A JPS5184580 A JP S5184580A
Authority
JP
Japan
Prior art keywords
gasuetsu
chingusochi
gasuetsu chingusochi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP864275A
Other languages
English (en)
Other versions
JPS5314472B2 (ja
Inventor
Yasuhiro Horiike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP864275A priority Critical patent/JPS5184580A/ja
Priority to US05/647,448 priority patent/US4123663A/en
Priority to DE2601288A priority patent/DE2601288B2/de
Publication of JPS5184580A publication Critical patent/JPS5184580A/ja
Publication of JPS5314472B2 publication Critical patent/JPS5314472B2/ja
Priority to US05/933,846 priority patent/US4192706A/en
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP864275A 1975-01-22 1975-01-22 Gasuetsuchingusochi Granted JPS5184580A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP864275A JPS5184580A (ja) 1975-01-22 1975-01-22 Gasuetsuchingusochi
US05/647,448 US4123663A (en) 1975-01-22 1976-01-08 Gas-etching device
DE2601288A DE2601288B2 (de) 1975-01-22 1976-01-15 Gas-Ätzvorrichtung
US05/933,846 US4192706A (en) 1975-01-22 1978-08-15 Gas-etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP864275A JPS5184580A (ja) 1975-01-22 1975-01-22 Gasuetsuchingusochi

Publications (2)

Publication Number Publication Date
JPS5184580A true JPS5184580A (ja) 1976-07-23
JPS5314472B2 JPS5314472B2 (ja) 1978-05-17

Family

ID=11698595

Family Applications (1)

Application Number Title Priority Date Filing Date
JP864275A Granted JPS5184580A (ja) 1975-01-22 1975-01-22 Gasuetsuchingusochi

Country Status (1)

Country Link
JP (1) JPS5184580A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244174A (en) * 1975-10-06 1977-04-06 Hitachi Ltd Plasma treatment device
JPS5329065A (en) * 1976-08-31 1978-03-17 Toshiba Corp Vapour phase reaction unit of semiconductor
JPS5384684A (en) * 1976-12-29 1978-07-26 Fujitsu Ltd Plasma etching device
JPS552199U (ja) * 1979-07-05 1980-01-09
JPS59145530A (ja) * 1983-12-23 1984-08-21 Hitachi Ltd プラズマ処理装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244174A (en) * 1975-10-06 1977-04-06 Hitachi Ltd Plasma treatment device
JPS5341505B2 (ja) * 1975-10-06 1978-11-04
JPS5329065A (en) * 1976-08-31 1978-03-17 Toshiba Corp Vapour phase reaction unit of semiconductor
JPS5384684A (en) * 1976-12-29 1978-07-26 Fujitsu Ltd Plasma etching device
JPS552199U (ja) * 1979-07-05 1980-01-09
JPS59145530A (ja) * 1983-12-23 1984-08-21 Hitachi Ltd プラズマ処理装置

Also Published As

Publication number Publication date
JPS5314472B2 (ja) 1978-05-17

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