JPS5170292A - - Google Patents
Info
- Publication number
- JPS5170292A JPS5170292A JP50134612A JP13461275A JPS5170292A JP S5170292 A JPS5170292 A JP S5170292A JP 50134612 A JP50134612 A JP 50134612A JP 13461275 A JP13461275 A JP 13461275A JP S5170292 A JPS5170292 A JP S5170292A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
- C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7437077A FR2290458A1 (fr) | 1974-11-08 | 1974-11-08 | Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5170292A true JPS5170292A (OSRAM) | 1976-06-17 |
Family
ID=9144792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50134612A Pending JPS5170292A (OSRAM) | 1974-11-08 | 1975-11-08 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4041191A (OSRAM) |
| JP (1) | JPS5170292A (OSRAM) |
| DE (1) | DE2549638A1 (OSRAM) |
| FR (1) | FR2290458A1 (OSRAM) |
| GB (1) | GB1533264A (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5471579A (en) * | 1977-11-17 | 1979-06-08 | Matsushita Electric Ind Co Ltd | Electron beam resist |
| US4208211A (en) * | 1978-05-23 | 1980-06-17 | Bell Telephone Laboratories, Incorporated | Fabrication based on radiation sensitive resists and related products |
| US4262081A (en) * | 1979-11-21 | 1981-04-14 | Bell Telephone Laboratories, Incorporated | Fabrication based on radiation sensitive resists of halo-alkyl styrene polymers |
| US4600683A (en) * | 1985-04-22 | 1986-07-15 | International Business Machines Corp. | Cross-linked polyalkenyl phenol based photoresist compositions |
| EP0422628A3 (en) * | 1989-10-13 | 1992-02-26 | E.I. Du Pont De Nemours And Company | Photosensitive element |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE465271A (OSRAM) * | 1941-12-31 | 1900-01-01 | ||
| US2892712A (en) * | 1954-04-23 | 1959-06-30 | Du Pont | Process for preparing relief images |
| GB1002343A (en) * | 1962-09-11 | 1965-08-25 | Canadian Ind | Process for hydroxyalkylating polymers containing carboxyl groups |
| US3535137A (en) * | 1967-01-13 | 1970-10-20 | Ibm | Method of fabricating etch resistant masks |
| JPS5137320B1 (OSRAM) * | 1967-11-09 | 1976-10-14 | ||
| JPS4825050B1 (OSRAM) * | 1968-11-07 | 1973-07-26 | ||
| US3799915A (en) * | 1971-08-20 | 1974-03-26 | Western Litho Plate & Supply | Photopolymers |
| US3859099A (en) * | 1972-12-22 | 1975-01-07 | Eastman Kodak Co | Positive plate incorporating diazoquinone |
-
1974
- 1974-11-08 FR FR7437077A patent/FR2290458A1/fr active Granted
-
1975
- 1975-11-05 DE DE19752549638 patent/DE2549638A1/de not_active Withdrawn
- 1975-11-06 US US05/629,543 patent/US4041191A/en not_active Expired - Lifetime
- 1975-11-08 JP JP50134612A patent/JPS5170292A/ja active Pending
- 1975-11-10 GB GB46445/75A patent/GB1533264A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US4041191A (en) | 1977-08-09 |
| FR2290458A1 (fr) | 1976-06-04 |
| FR2290458B1 (OSRAM) | 1978-07-07 |
| DE2549638A1 (de) | 1976-05-20 |
| GB1533264A (en) | 1978-11-22 |