FR2290458A1 - Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques - Google Patents

Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques

Info

Publication number
FR2290458A1
FR2290458A1 FR7437077A FR7437077A FR2290458A1 FR 2290458 A1 FR2290458 A1 FR 2290458A1 FR 7437077 A FR7437077 A FR 7437077A FR 7437077 A FR7437077 A FR 7437077A FR 2290458 A1 FR2290458 A1 FR 2290458A1
Authority
FR
France
Prior art keywords
realization
manufacture
application
electronic components
high resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7437077A
Other languages
English (en)
French (fr)
Other versions
FR2290458B1 (OSRAM
Inventor
Jean-Claude Dubois
Pierre Lecler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7437077A priority Critical patent/FR2290458A1/fr
Priority to DE19752549638 priority patent/DE2549638A1/de
Priority to US05/629,543 priority patent/US4041191A/en
Priority to JP50134612A priority patent/JPS5170292A/ja
Priority to GB46445/75A priority patent/GB1533264A/en
Publication of FR2290458A1 publication Critical patent/FR2290458A1/fr
Application granted granted Critical
Publication of FR2290458B1 publication Critical patent/FR2290458B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR7437077A 1974-11-08 1974-11-08 Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques Granted FR2290458A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7437077A FR2290458A1 (fr) 1974-11-08 1974-11-08 Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques
DE19752549638 DE2549638A1 (de) 1974-11-08 1975-11-05 Elektronenempfindliche harze
US05/629,543 US4041191A (en) 1974-11-08 1975-11-06 Resins for use as electron resists
JP50134612A JPS5170292A (OSRAM) 1974-11-08 1975-11-08
GB46445/75A GB1533264A (en) 1974-11-08 1975-11-10 Electron-sensitive polymers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7437077A FR2290458A1 (fr) 1974-11-08 1974-11-08 Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques

Publications (2)

Publication Number Publication Date
FR2290458A1 true FR2290458A1 (fr) 1976-06-04
FR2290458B1 FR2290458B1 (OSRAM) 1978-07-07

Family

ID=9144792

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7437077A Granted FR2290458A1 (fr) 1974-11-08 1974-11-08 Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques

Country Status (5)

Country Link
US (1) US4041191A (OSRAM)
JP (1) JPS5170292A (OSRAM)
DE (1) DE2549638A1 (OSRAM)
FR (1) FR2290458A1 (OSRAM)
GB (1) GB1533264A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2409534A1 (fr) * 1977-11-17 1979-06-15 Matsushita Electric Industrial Co Ltd Vernis photosensible destine a former un motif positif a l'aide d'un rayonnement
EP0422628A3 (en) * 1989-10-13 1992-02-26 E.I. Du Pont De Nemours And Company Photosensitive element

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208211A (en) * 1978-05-23 1980-06-17 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists and related products
US4262081A (en) * 1979-11-21 1981-04-14 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists of halo-alkyl styrene polymers
US4600683A (en) * 1985-04-22 1986-07-15 International Business Machines Corp. Cross-linked polyalkenyl phenol based photoresist compositions

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB780218A (en) * 1954-04-23 1957-07-31 Du Pont Photographic process for preparing intaglio and relief images
GB1002343A (en) * 1962-09-11 1965-08-25 Canadian Ind Process for hydroxyalkylating polymers containing carboxyl groups
FR1548846A (OSRAM) * 1967-01-13 1968-12-06

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE465271A (OSRAM) * 1941-12-31 1900-01-01
JPS5137320B1 (OSRAM) * 1967-11-09 1976-10-14
JPS4825050B1 (OSRAM) * 1968-11-07 1973-07-26
US3799915A (en) * 1971-08-20 1974-03-26 Western Litho Plate & Supply Photopolymers
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB780218A (en) * 1954-04-23 1957-07-31 Du Pont Photographic process for preparing intaglio and relief images
GB1002343A (en) * 1962-09-11 1965-08-25 Canadian Ind Process for hydroxyalkylating polymers containing carboxyl groups
FR1548846A (OSRAM) * 1967-01-13 1968-12-06

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2409534A1 (fr) * 1977-11-17 1979-06-15 Matsushita Electric Industrial Co Ltd Vernis photosensible destine a former un motif positif a l'aide d'un rayonnement
EP0422628A3 (en) * 1989-10-13 1992-02-26 E.I. Du Pont De Nemours And Company Photosensitive element

Also Published As

Publication number Publication date
JPS5170292A (OSRAM) 1976-06-17
US4041191A (en) 1977-08-09
FR2290458B1 (OSRAM) 1978-07-07
DE2549638A1 (de) 1976-05-20
GB1533264A (en) 1978-11-22

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Legal Events

Date Code Title Description
ST Notification of lapse