JPS515935B2 - - Google Patents
Info
- Publication number
- JPS515935B2 JPS515935B2 JP47037702A JP3770272A JPS515935B2 JP S515935 B2 JPS515935 B2 JP S515935B2 JP 47037702 A JP47037702 A JP 47037702A JP 3770272 A JP3770272 A JP 3770272A JP S515935 B2 JPS515935 B2 JP S515935B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/0085—Azides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47037702A JPS515935B2 (US20080094685A1-20080424-C00004.png) | 1972-04-17 | 1972-04-17 | |
| US350012A US3884703A (en) | 1972-04-17 | 1973-04-11 | Bisazide sensitized photoresistor composition with diacetone acrylamide |
| DE2318855A DE2318855B2 (de) | 1972-04-17 | 1973-04-13 | Photolack |
| GB1798473A GB1414837A (en) | 1972-04-17 | 1973-04-13 | Photoresist composition |
| FR7313721A FR2180850B1 (US20080094685A1-20080424-C00004.png) | 1972-04-17 | 1973-04-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47037702A JPS515935B2 (US20080094685A1-20080424-C00004.png) | 1972-04-17 | 1972-04-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS491225A JPS491225A (US20080094685A1-20080424-C00004.png) | 1974-01-08 |
| JPS515935B2 true JPS515935B2 (US20080094685A1-20080424-C00004.png) | 1976-02-24 |
Family
ID=12504849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47037702A Expired JPS515935B2 (US20080094685A1-20080424-C00004.png) | 1972-04-17 | 1972-04-17 |
Country Status (5)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5590145U (US20080094685A1-20080424-C00004.png) * | 1978-12-19 | 1980-06-21 | ||
| JPS6338693Y2 (US20080094685A1-20080424-C00004.png) * | 1979-01-26 | 1988-10-12 |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4086090A (en) * | 1973-07-25 | 1978-04-25 | Hitachi, Ltd. | Formation of pattern using acrylamide-diacetoneacrylamide copolymer |
| JPS5089066A (US20080094685A1-20080424-C00004.png) * | 1973-12-07 | 1975-07-17 | ||
| JPS50108003A (US20080094685A1-20080424-C00004.png) * | 1974-02-01 | 1975-08-26 | ||
| JPS5847811B2 (ja) * | 1974-06-17 | 1983-10-25 | 株式会社日立製作所 | ケイコウメンノ セイゾウホウホウ |
| JPS51149021A (en) * | 1974-12-28 | 1976-12-21 | Fuji Yakuhin Kogyo Kk | Water soluble photosensitive resin composition |
| JPS56101144A (en) * | 1980-01-16 | 1981-08-13 | Kimoto & Co Ltd | Photosensitive material and its developing method |
| JPS56137347A (en) * | 1980-03-29 | 1981-10-27 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition for dry development |
| JPS5744143A (en) * | 1980-08-29 | 1982-03-12 | Tokyo Ohka Kogyo Co Ltd | Composition and method for forming micropattern |
| JPS56167210U (US20080094685A1-20080424-C00004.png) * | 1981-04-21 | 1981-12-10 | ||
| JPS57179115U (US20080094685A1-20080424-C00004.png) * | 1981-05-11 | 1982-11-13 | ||
| JPS6161413U (US20080094685A1-20080424-C00004.png) * | 1984-09-28 | 1986-04-25 | ||
| US5190845A (en) * | 1987-07-28 | 1993-03-02 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin composition and color filter comprising a polymer dyeable with an anionic dye, an azide compound and a compound with at least two acrylol groups |
| JPH0271115A (ja) * | 1988-05-31 | 1990-03-09 | Ichikoh Ind Ltd | 光電的水準装置 |
| DE69324942T2 (de) * | 1992-02-14 | 1999-10-07 | Shipley Co | Strahlungsempfindliche Zusammensetzungen und Verfahren |
| DE19705909A1 (de) * | 1996-08-23 | 1998-08-20 | Inst Physikalische Hochtech Ev | Neuartige Dünnschichten für die Mikrosystemtechnik und Mikrostrukturierung sowie ihre Verwendung |
| KR20020077948A (ko) | 2001-04-03 | 2002-10-18 | 삼성에스디아이 주식회사 | 칼라음극선관용 포토레지스트 제조용 단량체,칼라음극선관용 포토레지스트 중합체, 칼라음극선관용포토레지스트 조성물 및 칼라음극선관용 형광막 조성물 |
| US7329618B2 (en) * | 2005-06-28 | 2008-02-12 | Micron Technology, Inc. | Ion implanting methods |
| US20080047930A1 (en) * | 2006-08-23 | 2008-02-28 | Graciela Beatriz Blanchet | Method to form a pattern of functional material on a substrate |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL150528B (nl) * | 1949-05-14 | Hollandse Signaalapparaten Bv | Werkwijze voor het vervaardigen van twistloos of nagenoeg twistloos garen en het door toepassing van deze werkwijze verkregen garen. | |
| GB678599A (en) * | 1949-10-10 | 1952-09-03 | Kalle & Co Ag | Improvements relating to the production of colloid photo-images for use in photomechanical printing |
| BE595534A (US20080094685A1-20080424-C00004.png) * | 1959-10-02 | |||
| NL131669C (US20080094685A1-20080424-C00004.png) * | 1959-10-02 | |||
| US3278305A (en) * | 1963-07-12 | 1966-10-11 | Gevaert Photo Prod Nv | Photochemical cross-linking of polymers |
| US3475176A (en) * | 1966-09-06 | 1969-10-28 | Eastman Kodak Co | Azide sensitized photosensitive prepolymer compositions |
| GB1230772A (US20080094685A1-20080424-C00004.png) * | 1967-03-31 | 1971-05-05 | ||
| US3615538A (en) * | 1968-08-02 | 1971-10-26 | Printing Dev Inc | Photosensitive printing plates |
| US3616370A (en) * | 1969-02-24 | 1971-10-26 | Lubrizol Corp | Crosslinking of unsaturated polyesters with n-3-oxohydrocarbon-substituted acrylamides |
| BE759079A (nl) * | 1969-12-23 | 1971-05-18 | Agfa Gevaert Nv | Verknoping onder invloed van licht van lichtgevoelige polymere samenstellingen die azidogroepen bevatten |
| US3816559A (en) * | 1970-07-20 | 1974-06-11 | Lubrizol Corp | Solid,curable compositions containing oxoalkyl acrylamides |
| US3715210A (en) * | 1971-02-19 | 1973-02-06 | Howson Algraphy Ltd | Lithographic printing plates |
| JPS5033767B1 (US20080094685A1-20080424-C00004.png) * | 1971-03-11 | 1975-11-04 | ||
| US3737319A (en) * | 1971-03-15 | 1973-06-05 | Eastman Kodak Co | Photographic elements comprising photo-sensitive polymers |
| US3725231A (en) * | 1971-08-20 | 1973-04-03 | Lubrizol Corp | Photosensitive diacetone acrylamide resins |
-
1972
- 1972-04-17 JP JP47037702A patent/JPS515935B2/ja not_active Expired
-
1973
- 1973-04-11 US US350012A patent/US3884703A/en not_active Expired - Lifetime
- 1973-04-13 DE DE2318855A patent/DE2318855B2/de active Pending
- 1973-04-13 GB GB1798473A patent/GB1414837A/en not_active Expired
- 1973-04-16 FR FR7313721A patent/FR2180850B1/fr not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5590145U (US20080094685A1-20080424-C00004.png) * | 1978-12-19 | 1980-06-21 | ||
| JPS6338693Y2 (US20080094685A1-20080424-C00004.png) * | 1979-01-26 | 1988-10-12 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2180850A1 (US20080094685A1-20080424-C00004.png) | 1973-11-30 |
| FR2180850B1 (US20080094685A1-20080424-C00004.png) | 1976-05-21 |
| GB1414837A (en) | 1975-11-19 |
| US3884703A (en) | 1975-05-20 |
| DE2318855A1 (de) | 1973-10-25 |
| JPS491225A (US20080094685A1-20080424-C00004.png) | 1974-01-08 |
| DE2318855B2 (de) | 1975-07-17 |
