JPS5153903A - Mizu arukariseinitegenzokanono hangioseizosurutamenokomojoketsugoseiseikeishitsu - Google Patents

Mizu arukariseinitegenzokanono hangioseizosurutamenokomojoketsugoseiseikeishitsu

Info

Publication number
JPS5153903A
JPS5153903A JP10657075A JP10657075A JPS5153903A JP S5153903 A JPS5153903 A JP S5153903A JP 10657075 A JP10657075 A JP 10657075A JP 10657075 A JP10657075 A JP 10657075A JP S5153903 A JPS5153903 A JP S5153903A
Authority
JP
Japan
Prior art keywords
hangioseizosurutamenokomojoketsugoseiseikeishitsu
arukariseinitegenzokanono
mizu
mizu arukariseinitegenzokanono
arukariseinitegenzokanono hangioseizosurutamenokomojoketsugoseiseikeishitsu
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10657075A
Other languages
Japanese (ja)
Inventor
Rentsu Ueruneru
Ururihi Ueruteru Haintsu
Harutoman Hainrihi
Furanshisuko Kesada Rukasu
Pentsuiin Kurausu
Reeneru Augusuto
Hofuman Geruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS5153903A publication Critical patent/JPS5153903A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP10657075A 1974-09-12 1975-09-04 Mizu arukariseinitegenzokanono hangioseizosurutamenokomojoketsugoseiseikeishitsu Pending JPS5153903A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742443665 DE2443665A1 (en) 1974-09-12 1974-09-12 PHOTO-NETWORKABLE MOLDING COMPOUNDS FOR THE MANUFACTURE OF AQUATIC-ALKALINE DEVELOPMENT FORMS

Publications (1)

Publication Number Publication Date
JPS5153903A true JPS5153903A (en) 1976-05-12

Family

ID=5925569

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10657075A Pending JPS5153903A (en) 1974-09-12 1975-09-04 Mizu arukariseinitegenzokanono hangioseizosurutamenokomojoketsugoseiseikeishitsu

Country Status (4)

Country Link
JP (1) JPS5153903A (en)
DE (1) DE2443665A1 (en)
FR (1) FR2284621A1 (en)
GB (1) GB1519013A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1122999A (en) * 1978-05-01 1982-05-04 Alan D. Rousseau Photopolymerizable composition
JPS56120718A (en) * 1980-02-28 1981-09-22 Asahi Chem Ind Co Ltd Improved polyurethane type photosensitive resin composition
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4422914A (en) * 1981-01-16 1983-12-27 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4451636A (en) * 1981-01-16 1984-05-29 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4481281A (en) * 1981-01-16 1984-11-06 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4506055A (en) * 1983-06-23 1985-03-19 Ici Americas Inc. Carboxy modified vinyl ester urethane resins
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
US6207346B1 (en) 1997-04-09 2001-03-27 Advanced Coatings International Waterborne photoresists made from urethane acrylates

Also Published As

Publication number Publication date
FR2284621B1 (en) 1980-04-11
GB1519013A (en) 1978-07-26
DE2443665A1 (en) 1976-03-25
FR2284621A1 (en) 1976-04-09

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