JPS5149236B2 - - Google Patents
Info
- Publication number
- JPS5149236B2 JPS5149236B2 JP46071208A JP7120871A JPS5149236B2 JP S5149236 B2 JPS5149236 B2 JP S5149236B2 JP 46071208 A JP46071208 A JP 46071208A JP 7120871 A JP7120871 A JP 7120871A JP S5149236 B2 JPS5149236 B2 JP S5149236B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP46071208A JPS5149236B2 (ja) | 1971-09-16 | 1971-09-16 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP46071208A JPS5149236B2 (ja) | 1971-09-16 | 1971-09-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4838189A JPS4838189A (ja) | 1973-06-05 |
JPS5149236B2 true JPS5149236B2 (ja) | 1976-12-25 |
Family
ID=13454017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP46071208A Expired JPS5149236B2 (ja) | 1971-09-16 | 1971-09-16 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5149236B2 (ja) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5564043U (ja) * | 1978-10-25 | 1980-05-01 | ||
JPS6139241Y2 (ja) * | 1981-02-13 | 1986-11-11 | ||
JPS626431Y2 (ja) * | 1983-12-02 | 1987-02-14 | ||
US10394122B2 (en) | 2016-06-28 | 2019-08-27 | Toyko Ohka Kogyo Co., Ltd. | Resist composition, method for forming resist pattern, compound, and acid generator |
US10649330B2 (en) | 2016-11-29 | 2020-05-12 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound, and acid generator |
KR20200050870A (ko) | 2018-11-02 | 2020-05-12 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
KR20200067758A (ko) | 2018-12-04 | 2020-06-12 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물, 레지스트 패턴 형성 방법, 및 화합물 |
KR20200067759A (ko) | 2018-12-04 | 2020-06-12 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물, 레지스트 패턴 형성 방법, 및 화합물 |
KR20210055614A (ko) | 2019-11-07 | 2021-05-17 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
US11204551B2 (en) | 2016-06-28 | 2021-12-21 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method for forming resist pattern |
US11221557B2 (en) | 2018-05-28 | 2022-01-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound, and acid generator |
US11256169B2 (en) | 2018-05-28 | 2022-02-22 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, and method of forming resist pattern |
-
1971
- 1971-09-16 JP JP46071208A patent/JPS5149236B2/ja not_active Expired
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5564043U (ja) * | 1978-10-25 | 1980-05-01 | ||
JPS6139241Y2 (ja) * | 1981-02-13 | 1986-11-11 | ||
JPS626431Y2 (ja) * | 1983-12-02 | 1987-02-14 | ||
US11204551B2 (en) | 2016-06-28 | 2021-12-21 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method for forming resist pattern |
US10394122B2 (en) | 2016-06-28 | 2019-08-27 | Toyko Ohka Kogyo Co., Ltd. | Resist composition, method for forming resist pattern, compound, and acid generator |
US10649330B2 (en) | 2016-11-29 | 2020-05-12 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound, and acid generator |
US11221557B2 (en) | 2018-05-28 | 2022-01-11 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern, compound, and acid generator |
US11256169B2 (en) | 2018-05-28 | 2022-02-22 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, and method of forming resist pattern |
KR20200050870A (ko) | 2018-11-02 | 2020-05-12 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
US11372329B2 (en) | 2018-11-02 | 2022-06-28 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
KR20200067758A (ko) | 2018-12-04 | 2020-06-12 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물, 레지스트 패턴 형성 방법, 및 화합물 |
KR20200067759A (ko) | 2018-12-04 | 2020-06-12 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물, 레지스트 패턴 형성 방법, 및 화합물 |
KR20210055614A (ko) | 2019-11-07 | 2021-05-17 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
Also Published As
Publication number | Publication date |
---|---|
JPS4838189A (ja) | 1973-06-05 |