JPS5146001B2 - - Google Patents

Info

Publication number
JPS5146001B2
JPS5146001B2 JP46073148A JP7314871A JPS5146001B2 JP S5146001 B2 JPS5146001 B2 JP S5146001B2 JP 46073148 A JP46073148 A JP 46073148A JP 7314871 A JP7314871 A JP 7314871A JP S5146001 B2 JPS5146001 B2 JP S5146001B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP46073148A
Other languages
Japanese (ja)
Other versions
JPS4838249A (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46073148A priority Critical patent/JPS5146001B2/ja
Priority to US00289957A priority patent/US3782940A/en
Priority to DE2246020A priority patent/DE2246020C3/de
Publication of JPS4838249A publication Critical patent/JPS4838249A/ja
Publication of JPS5146001B2 publication Critical patent/JPS5146001B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
JP46073148A 1971-09-20 1971-09-20 Expired JPS5146001B2 (enExample)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP46073148A JPS5146001B2 (enExample) 1971-09-20 1971-09-20
US00289957A US3782940A (en) 1971-09-20 1972-09-18 Ion-etching method
DE2246020A DE2246020C3 (de) 1971-09-20 1972-09-20 Verfahren zur Herstellung von Reliefoberflächen und Verwendung des Verfahrens zur Herstellung von Druckformen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46073148A JPS5146001B2 (enExample) 1971-09-20 1971-09-20

Publications (2)

Publication Number Publication Date
JPS4838249A JPS4838249A (enExample) 1973-06-05
JPS5146001B2 true JPS5146001B2 (enExample) 1976-12-07

Family

ID=13509808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46073148A Expired JPS5146001B2 (enExample) 1971-09-20 1971-09-20

Country Status (3)

Country Link
US (1) US3782940A (enExample)
JP (1) JPS5146001B2 (enExample)
DE (1) DE2246020C3 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654492A (ja) * 1992-06-29 1994-02-25 Besutetsuku:Kk 巻線機

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4968803A (enExample) * 1972-11-02 1974-07-03
CA1009607A (en) * 1972-11-29 1977-05-03 Heinz Dimigen Method of manufacturing etched structures in substrates by ion etching
US3890149A (en) * 1973-05-02 1975-06-17 American Can Co Waterless diazo planographic printing plates with epoxy-silane in undercoat and/or overcoat layers
JPS525884B2 (enExample) * 1973-05-09 1977-02-17
JPS5086102U (enExample) * 1973-12-07 1975-07-22
JPS53292B2 (enExample) * 1974-02-01 1978-01-07
US3907564A (en) * 1974-06-27 1975-09-23 Hercules Inc Preparing lithographic plates utilizing hydrolyzable mercapto-silane compounds
US3924520A (en) * 1974-06-27 1975-12-09 Hercules Inc Preparing lithographic plates utilizing vinyl monomers containing hydrolyzable silane groups
US3905816A (en) * 1974-06-27 1975-09-16 Hercules Inc Preparing lithographic plates utilizing hydrolyzable azoand azido-silane compounds
JPS5230851B2 (enExample) * 1974-10-11 1977-08-11
JPS5738897B2 (enExample) * 1974-11-19 1982-08-18
US4207105A (en) * 1975-01-27 1980-06-10 Fuji Photo Film Co., Ltd. Plasma-etching image in exposed AgX emulsion
JPS51105821A (en) * 1975-03-14 1976-09-20 Fuji Photo Film Co Ltd Masukugazono keiseihoho
JPS51120804A (en) * 1975-04-14 1976-10-22 Dainippon Printing Co Ltd Plate for lithographic printing
US4045318A (en) * 1976-07-30 1977-08-30 Rca Corporation Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer
JPS5497101U (enExample) * 1977-12-21 1979-07-09
GB2057476B (en) * 1979-08-29 1983-06-22 Shinetsu Chemical Co Photocurable organopolysiloxane compositions
DE3106186A1 (de) * 1981-02-19 1982-09-09 Wacker-Chemie GmbH, 8000 München Verfahren zur herstellung von organopolysiloxanen und verwendung dieser organop
US4500628A (en) * 1981-04-22 1985-02-19 At&T Bell Laboratories Process of making solid state devices using silicon containing organometallic plasma developed resists
US4396704A (en) * 1981-04-22 1983-08-02 Bell Telephone Laboratories, Incorporated Solid state devices produced by organometallic plasma developed resists
JPS6020919B2 (ja) * 1981-09-18 1985-05-24 住友電気工業株式会社 印刷配線板の製造方法
US4528081A (en) * 1983-10-03 1985-07-09 Loctite Corporation Dual curing silicone, method of preparing same and dielectric soft-gel compositions thereof
DE3541327A1 (de) * 1985-11-22 1987-05-27 Schwerionenforsch Gmbh Streuplatte zum auffangen eines reellen bildes in optischen systemen
FR2597110A1 (fr) * 1986-04-14 1987-10-16 Rhone Poulenc Multi Tech Composition organopolysiloxane, potentiellement reticulable et utilisable notamment en microlithographie, et son procede d'application
US5063254A (en) * 1988-04-04 1991-11-05 Loctite Corporation MTQ/polysiloxane hybrid resins, method of making the same, and coating/potting compositions containing the same
US5162472A (en) * 1990-10-09 1992-11-10 Siltech Inc. Free radical silicone polymers
JP4909042B2 (ja) * 2006-12-14 2012-04-04 本田技研工業株式会社 ダブルクラッチ用クラッチドラム成形装置
CN102666731B (zh) * 2009-12-04 2014-12-31 道康宁公司 硅倍半氧烷树脂的稳定化
WO2016115640A1 (en) * 2015-01-23 2016-07-28 Li Minggan Methods and apparatus for creation of wrinkles in three-dimensional surfaces, and compositions of matter resulting from same
BR112018000244B8 (pt) 2015-07-06 2022-09-06 Bluestar Silicones France Itens autoadesivos de camadas múltiplas, processo para a preparação de um item autoadesivo de camadas múltiplas, composição c de silicone curável, substrato, e usos de um item autoadesivo de camadas múltiplas e de um substrato

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2922806A (en) * 1957-02-01 1960-01-26 Dow Corning Preparation of acryloxyalkyl substituted siloxanes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654492A (ja) * 1992-06-29 1994-02-25 Besutetsuku:Kk 巻線機

Also Published As

Publication number Publication date
DE2246020C3 (de) 1982-01-14
JPS4838249A (enExample) 1973-06-05
DE2246020A1 (de) 1973-03-29
DE2246020B2 (de) 1981-04-23
US3782940A (en) 1974-01-01

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