JPS5134293B2 - - Google Patents

Info

Publication number
JPS5134293B2
JPS5134293B2 JP5079274A JP5079274A JPS5134293B2 JP S5134293 B2 JPS5134293 B2 JP S5134293B2 JP 5079274 A JP5079274 A JP 5079274A JP 5079274 A JP5079274 A JP 5079274A JP S5134293 B2 JPS5134293 B2 JP S5134293B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5079274A
Other languages
Japanese (ja)
Other versions
JPS5019426A (cg-RX-API-DMAC10.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5019426A publication Critical patent/JPS5019426A/ja
Publication of JPS5134293B2 publication Critical patent/JPS5134293B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
JP5079274A 1973-05-09 1974-05-09 Expired JPS5134293B2 (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US358728A US3920454A (en) 1973-05-09 1973-05-09 Fabrication of iron oxide pattern

Publications (2)

Publication Number Publication Date
JPS5019426A JPS5019426A (cg-RX-API-DMAC10.html) 1975-02-28
JPS5134293B2 true JPS5134293B2 (cg-RX-API-DMAC10.html) 1976-09-25

Family

ID=23410786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5079274A Expired JPS5134293B2 (cg-RX-API-DMAC10.html) 1973-05-09 1974-05-09

Country Status (7)

Country Link
US (1) US3920454A (cg-RX-API-DMAC10.html)
JP (1) JPS5134293B2 (cg-RX-API-DMAC10.html)
CA (1) CA1042732A (cg-RX-API-DMAC10.html)
FR (1) FR2229083B1 (cg-RX-API-DMAC10.html)
GB (1) GB1465110A (cg-RX-API-DMAC10.html)
IT (1) IT1014142B (cg-RX-API-DMAC10.html)
NL (1) NL160144C (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427804U (cg-RX-API-DMAC10.html) * 1977-07-25 1979-02-23

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4332879A (en) * 1978-12-01 1982-06-01 Hughes Aircraft Company Process for depositing a film of controlled composition using a metallo-organic photoresist
US4348473A (en) * 1981-03-04 1982-09-07 Xerox Corporation Dry process for the production of microelectronic devices
JPS5993445A (ja) * 1982-11-19 1984-05-29 Hitachi Ltd 金属酸化膜形成用組成物及び該組成物を使用する金属酸化膜形成方法
JPS6232603U (cg-RX-API-DMAC10.html) * 1985-08-09 1987-02-26
IN169343B (cg-RX-API-DMAC10.html) * 1986-04-05 1991-09-28 Cassella Farbwerke Mainkur Ag
RU2158228C1 (ru) * 1999-05-28 2000-10-27 Институт катализа им. Г.К. Борескова СО РАН Способ получения железосодержащих оксидных материалов
US7939129B2 (en) * 2004-01-26 2011-05-10 Pilington North America, Inc. Deposition of iron oxide coatings on a glass substrate
JP5819810B2 (ja) * 2012-12-18 2015-11-24 信越化学工業株式会社 ネガ型レジスト材料及びこれを用いたパターン形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3335008A (en) * 1964-04-02 1967-08-08 Eastman Kodak Co Photographic elements containing ferrocene derivative and method of processing
GB1095567A (cg-RX-API-DMAC10.html) * 1964-04-15
US3352888A (en) * 1964-11-02 1967-11-14 American Cyanamid Co Organometallo-semiconducting materials
US3577235A (en) * 1969-02-17 1971-05-04 Eastman Kodak Co Electrophotographic composition and element
CA972142A (en) * 1970-04-08 1975-08-05 Minnesota Mining And Manufacturing Company Photoconductive compositions
US3681227A (en) * 1970-06-29 1972-08-01 Corning Glass Works Microcircuit mask and method
US3695908A (en) * 1970-06-29 1972-10-03 Raymond E Szupillo Thin films of alpha fe2o3 and method of forming

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427804U (cg-RX-API-DMAC10.html) * 1977-07-25 1979-02-23

Also Published As

Publication number Publication date
NL7406191A (cg-RX-API-DMAC10.html) 1974-11-12
IT1014142B (it) 1977-04-20
GB1465110A (en) 1977-02-23
FR2229083B1 (cg-RX-API-DMAC10.html) 1976-10-08
JPS5019426A (cg-RX-API-DMAC10.html) 1975-02-28
CA1042732A (en) 1978-11-21
US3920454A (en) 1975-11-18
FR2229083A1 (cg-RX-API-DMAC10.html) 1974-12-06
DE2421974A1 (de) 1974-11-28
NL160144B (nl) 1979-04-17
NL160144C (nl) 1979-09-17
DE2421974B2 (de) 1977-04-28

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