JPS5119982B2 - - Google Patents
Info
- Publication number
- JPS5119982B2 JPS5119982B2 JP47009095A JP909572A JPS5119982B2 JP S5119982 B2 JPS5119982 B2 JP S5119982B2 JP 47009095 A JP47009095 A JP 47009095A JP 909572 A JP909572 A JP 909572A JP S5119982 B2 JPS5119982 B2 JP S5119982B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/0085—Azides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47009095A JPS5119982B2 (nl) | 1972-01-26 | 1972-01-26 | |
| FR7302524A FR2169217B1 (nl) | 1972-01-26 | 1973-01-24 | |
| DE19732303671 DE2303671C3 (de) | 1972-01-26 | 1973-01-25 | Lichthärtbare Photoresistschicht |
| GB389273A GB1376114A (en) | 1972-01-26 | 1973-01-25 | Photoresist layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP47009095A JPS5119982B2 (nl) | 1972-01-26 | 1972-01-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4879617A JPS4879617A (nl) | 1973-10-25 |
| JPS5119982B2 true JPS5119982B2 (nl) | 1976-06-22 |
Family
ID=11711041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47009095A Expired JPS5119982B2 (nl) | 1972-01-26 | 1972-01-26 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5119982B2 (nl) |
| FR (1) | FR2169217B1 (nl) |
| GB (1) | GB1376114A (nl) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2441315A1 (de) * | 1974-08-29 | 1976-03-11 | Hoechst Ag | Mit o-naphthochinondiazidverbindung vorsensibilisierte druckplatte |
| JPS5741636A (en) * | 1980-08-27 | 1982-03-08 | Toshiba Corp | Photoresist composition |
| US4491629A (en) * | 1982-02-22 | 1985-01-01 | Tokyo Shibaura Denki Kabushiki Kaisha | Water soluble photoresist composition with bisazide, diazo, polymer and silane |
| NL8203980A (nl) * | 1982-10-15 | 1984-05-01 | Philips Nv | Werkwijze voor de fotolithografische behandeling van een substraat. |
| JPS60147729A (ja) * | 1984-01-12 | 1985-08-03 | Toshiba Corp | ホトレジスト組成物 |
| GB8403698D0 (en) * | 1984-02-13 | 1984-03-14 | British Telecomm | Semiconductor device fabrication |
| JPS6175304A (ja) * | 1984-09-21 | 1986-04-17 | Casio Comput Co Ltd | カラ−液晶表示素子 |
| US4950583A (en) * | 1986-09-17 | 1990-08-21 | Brewer Science Inc. | Adhesion promoting product and process for treating an integrated circuit substrate therewith |
| AU603908B2 (en) * | 1987-07-30 | 1990-11-29 | Minnesota Mining And Manufacturing Company | Subbing layers for photographic elements and photographic elements incorporating such layers |
| US4812519A (en) * | 1987-10-15 | 1989-03-14 | Hercules Incorporated | Crosslinking of vinyl silane and azidosilane modified thermoplastic polymers by moisture |
| US4886739A (en) * | 1988-08-10 | 1989-12-12 | Eastman Kodak Company | Thermally processable imaging element and process |
| WO2007004345A1 (ja) * | 2005-06-30 | 2007-01-11 | Toray Industries, Inc. | 感光性樹脂組成物および接着改良剤 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS494851A (nl) * | 1972-05-04 | 1974-01-17 |
-
1972
- 1972-01-26 JP JP47009095A patent/JPS5119982B2/ja not_active Expired
-
1973
- 1973-01-24 FR FR7302524A patent/FR2169217B1/fr not_active Expired
- 1973-01-25 GB GB389273A patent/GB1376114A/en not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS494851A (nl) * | 1972-05-04 | 1974-01-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2169217B1 (nl) | 1983-05-27 |
| FR2169217A1 (nl) | 1973-09-07 |
| DE2303671B2 (de) | 1975-10-23 |
| GB1376114A (en) | 1974-12-04 |
| JPS4879617A (nl) | 1973-10-25 |
| DE2303671A1 (de) | 1973-08-09 |