JPS5116754B1 - - Google Patents
Info
- Publication number
- JPS5116754B1 JPS5116754B1 JP45017888A JP1788870A JPS5116754B1 JP S5116754 B1 JPS5116754 B1 JP S5116754B1 JP 45017888 A JP45017888 A JP 45017888A JP 1788870 A JP1788870 A JP 1788870A JP S5116754 B1 JPS5116754 B1 JP S5116754B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/14—Lenses magnetic
- H01J37/141—Electromagnetic lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP45017888A JPS5116754B1 (fr) | 1970-03-04 | 1970-03-04 | |
US00120975A US3715580A (en) | 1970-03-04 | 1971-03-04 | Multi electron beam apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP45017888A JPS5116754B1 (fr) | 1970-03-04 | 1970-03-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5116754B1 true JPS5116754B1 (fr) | 1976-05-27 |
Family
ID=11956229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP45017888A Pending JPS5116754B1 (fr) | 1970-03-04 | 1970-03-04 |
Country Status (2)
Country | Link |
---|---|
US (1) | US3715580A (fr) |
JP (1) | JPS5116754B1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5539842U (fr) * | 1978-09-08 | 1980-03-14 |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52119178A (en) * | 1976-03-31 | 1977-10-06 | Toshiba Corp | Electron beam exposure device |
CA1100237A (fr) * | 1977-03-23 | 1981-04-28 | Roger F.W. Pease | Traduction non-disponible |
JPS5423476A (en) * | 1977-07-25 | 1979-02-22 | Akashi Seisakusho Kk | Composite electron lens |
US4465934A (en) * | 1981-01-23 | 1984-08-14 | Veeco Instruments Inc. | Parallel charged particle beam exposure system |
US4390789A (en) * | 1981-05-21 | 1983-06-28 | Control Data Corporation | Electron beam array lithography system employing multiple parallel array optics channels and method of operation |
NL8200559A (nl) * | 1982-02-15 | 1983-09-01 | Ir Jan Bart Le Poole Prof Dr | Bestralingsinrichting met bundelsplitsing. |
US6124140A (en) * | 1998-05-22 | 2000-09-26 | Micron Technology, Inc. | Method for measuring features of a semiconductor device |
WO2001075947A1 (fr) | 2000-04-04 | 2001-10-11 | Advantest Corporation | Appareil d'exposition multifaisceau comprenant une lentille elctronique multi-axiale, une lentille electronique multi-axiale pour la focalisation de faisceaux d'electrons, et procede de fabrication de dispositif semi-conducteur |
US6787780B2 (en) | 2000-04-04 | 2004-09-07 | Advantest Corporation | Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device |
US6750455B2 (en) * | 2001-07-02 | 2004-06-15 | Applied Materials, Inc. | Method and apparatus for multiple charged particle beams |
US6774646B1 (en) * | 2001-12-17 | 2004-08-10 | Kla-Tencor Corporation | Electron beam inspection system using multiple electron beams and uniform focus and deflection mechanisms |
EP1432007B1 (fr) * | 2002-12-17 | 2010-03-10 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Lentille composée à axes multiples, système de faisceau utilisant cette lentille, et procédé de fabrication de cette lentille |
GB2404782B (en) * | 2003-08-01 | 2005-12-07 | Leica Microsys Lithography Ltd | Pattern-writing equipment |
ATE441202T1 (de) * | 2004-05-17 | 2009-09-15 | Mapper Lithography Ip Bv | Belichtungssystem mit einem geladenen teilchenstrahl |
GB2414857B (en) * | 2004-06-03 | 2009-02-25 | Nanobeam Ltd | Apparatus for blanking a charged particle beam |
US8003953B2 (en) | 2009-12-11 | 2011-08-23 | Hermes Microvision, Inc. | Multi-axis magnetic lens |
EP2418672B1 (fr) | 2010-08-11 | 2013-03-20 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Lentille à axes multiples, système de faisceau utilisant la lentille et procédé de fabrication de la lentille |
US8294095B2 (en) | 2010-12-14 | 2012-10-23 | Hermes Microvision, Inc. | Apparatus of plural charged particle beams with multi-axis magnetic lens |
US8445862B2 (en) | 2010-12-14 | 2013-05-21 | Hermes Microvision, Inc. | Apparatus of plural charged particle beams with multi-axis magnetic lens |
US9000394B2 (en) | 2011-12-20 | 2015-04-07 | Hermes Microvision, Inc. | Multi-axis magnetic lens for focusing a plurality of charged particle beams |
US9105440B2 (en) * | 2013-08-30 | 2015-08-11 | Hermes Microvision, Inc. | Apparatus of plural charged particle beams with multi-axis magnetic lens |
US9202658B2 (en) * | 2013-12-20 | 2015-12-01 | Hermes Microvision, Inc. | Multi-axis magnetic lens for focusing a plurality of charged particle beams |
US9431209B2 (en) | 2014-08-26 | 2016-08-30 | Hermes-Microvision, Inc. | Apparatus of plural charged particle beams with multi-axis magnetic lenses |
US9984848B2 (en) * | 2016-03-10 | 2018-05-29 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi-beam lens device, charged particle beam device, and method of operating a multi-beam lens device |
KR20200123319A (ko) * | 2019-04-18 | 2020-10-29 | 삼성디스플레이 주식회사 | 렌즈 모듈 및 이를 포함한 기판 절단 장치 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3519873A (en) * | 1968-12-18 | 1970-07-07 | Westinghouse Electric Corp | Multiple beam electron source for pattern generation |
-
1970
- 1970-03-04 JP JP45017888A patent/JPS5116754B1/ja active Pending
-
1971
- 1971-03-04 US US00120975A patent/US3715580A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5539842U (fr) * | 1978-09-08 | 1980-03-14 |
Also Published As
Publication number | Publication date |
---|---|
US3715580A (en) | 1973-02-06 |