JPS5116235B2 - - Google Patents

Info

Publication number
JPS5116235B2
JPS5116235B2 JP48025270A JP2527073A JPS5116235B2 JP S5116235 B2 JPS5116235 B2 JP S5116235B2 JP 48025270 A JP48025270 A JP 48025270A JP 2527073 A JP2527073 A JP 2527073A JP S5116235 B2 JPS5116235 B2 JP S5116235B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48025270A
Other languages
Japanese (ja)
Other versions
JPS49113887A (cg-RX-API-DMAC7.html
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP48025270A priority Critical patent/JPS5116235B2/ja
Priority to US440770A priority patent/US3923703A/en
Priority to NL7401941A priority patent/NL7401941A/xx
Priority to FR7404859A priority patent/FR2219955B1/fr
Priority to GB936274A priority patent/GB1404927A/en
Priority to CA193,832A priority patent/CA1046683A/en
Priority to DE2410066A priority patent/DE2410066A1/de
Priority to IT48932/74A priority patent/IT1004348B/it
Publication of JPS49113887A publication Critical patent/JPS49113887A/ja
Publication of JPS5116235B2 publication Critical patent/JPS5116235B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
    • C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
    • C08G65/3324—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof cyclic
    • C08G65/3326—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof cyclic aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/333—Polymers modified by chemical after-treatment with organic compounds containing nitrogen
    • C08G65/33396—Polymers modified by chemical after-treatment with organic compounds containing nitrogen having oxygen in addition to nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyethers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
JP48025270A 1973-03-03 1973-03-03 Expired JPS5116235B2 (cg-RX-API-DMAC7.html)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP48025270A JPS5116235B2 (cg-RX-API-DMAC7.html) 1973-03-03 1973-03-03
US440770A US3923703A (en) 1973-03-03 1974-02-08 Process for preparing photosensitive polymer
NL7401941A NL7401941A (cg-RX-API-DMAC7.html) 1973-03-03 1974-02-13
FR7404859A FR2219955B1 (cg-RX-API-DMAC7.html) 1973-03-03 1974-02-13
GB936274A GB1404927A (en) 1973-03-03 1974-03-01 Photosensitive polymers
CA193,832A CA1046683A (en) 1973-03-03 1974-03-01 Process for preparing photosensitive polymer
DE2410066A DE2410066A1 (de) 1973-03-03 1974-03-02 Verfahren zur herstellung eines photoempfindlichen polymeren
IT48932/74A IT1004348B (it) 1973-03-03 1974-03-04 Procedimento per la preparazione di un polimero fotosensibile

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48025270A JPS5116235B2 (cg-RX-API-DMAC7.html) 1973-03-03 1973-03-03

Publications (2)

Publication Number Publication Date
JPS49113887A JPS49113887A (cg-RX-API-DMAC7.html) 1974-10-30
JPS5116235B2 true JPS5116235B2 (cg-RX-API-DMAC7.html) 1976-05-22

Family

ID=12161322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48025270A Expired JPS5116235B2 (cg-RX-API-DMAC7.html) 1973-03-03 1973-03-03

Country Status (8)

Country Link
US (1) US3923703A (cg-RX-API-DMAC7.html)
JP (1) JPS5116235B2 (cg-RX-API-DMAC7.html)
CA (1) CA1046683A (cg-RX-API-DMAC7.html)
DE (1) DE2410066A1 (cg-RX-API-DMAC7.html)
FR (1) FR2219955B1 (cg-RX-API-DMAC7.html)
GB (1) GB1404927A (cg-RX-API-DMAC7.html)
IT (1) IT1004348B (cg-RX-API-DMAC7.html)
NL (1) NL7401941A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61150569U (cg-RX-API-DMAC7.html) * 1985-03-12 1986-09-17

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165418A (en) * 1971-04-15 1979-08-21 Imperial Chemical Industries Limited Paint manufacture
US4518473A (en) * 1981-08-06 1985-05-21 The Upjohn Company Compositions and process
US4446247A (en) * 1981-08-06 1984-05-01 The Upjohn Company Compositions and process
US4425208A (en) 1981-08-06 1984-01-10 The Upjohn Company Compositions and process
DE3227552A1 (de) * 1982-07-23 1984-01-26 Dynamit Nobel Ag, 5210 Troisdorf Copolymerisate mit ethylenisch ungesaettigten grundbausteinen und mehreren funktionellen gruppen
JPS61201239A (ja) * 1985-03-04 1986-09-05 Agency Of Ind Science & Technol 光情報記録用組成物
US5824717A (en) * 1988-05-27 1998-10-20 Exxon Chemical Patents Inc. Peroxide and radiation curable compositions containing isobutylenene copolymers having acrylate functionality
EP0563251A1 (en) * 1990-12-20 1993-10-06 Exxon Chemical Patents Inc. Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications
WO2026116390A1 (ja) * 2024-11-28 2026-06-04 東亞合成株式会社 ビニル系重合体の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4929683B1 (cg-RX-API-DMAC7.html) * 1970-09-16 1974-08-06

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61150569U (cg-RX-API-DMAC7.html) * 1985-03-12 1986-09-17

Also Published As

Publication number Publication date
JPS49113887A (cg-RX-API-DMAC7.html) 1974-10-30
NL7401941A (cg-RX-API-DMAC7.html) 1974-09-05
GB1404927A (en) 1975-09-03
FR2219955B1 (cg-RX-API-DMAC7.html) 1976-10-08
CA1046683A (en) 1979-01-16
IT1004348B (it) 1976-07-10
US3923703A (en) 1975-12-02
FR2219955A1 (cg-RX-API-DMAC7.html) 1974-09-27
DE2410066A1 (de) 1974-09-19

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