JPS51148361A - Formation method of insulation film - Google Patents

Formation method of insulation film

Info

Publication number
JPS51148361A
JPS51148361A JP7258375A JP7258375A JPS51148361A JP S51148361 A JPS51148361 A JP S51148361A JP 7258375 A JP7258375 A JP 7258375A JP 7258375 A JP7258375 A JP 7258375A JP S51148361 A JPS51148361 A JP S51148361A
Authority
JP
Japan
Prior art keywords
insulation film
formation method
oxigen
compose
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7258375A
Other languages
Japanese (ja)
Other versions
JPS588577B2 (en
Inventor
Toshiyuki Hirota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7258375A priority Critical patent/JPS588577B2/en
Publication of JPS51148361A publication Critical patent/JPS51148361A/en
Publication of JPS588577B2 publication Critical patent/JPS588577B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE:To form an insulation film which has an appointed amount to be etched by varying the pressure of nitrogen and oxigen which compose an atmospheric gas gradually to get an opening having a necessary inclined face.
JP7258375A 1975-06-14 1975-06-14 The best way to do it Expired JPS588577B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7258375A JPS588577B2 (en) 1975-06-14 1975-06-14 The best way to do it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7258375A JPS588577B2 (en) 1975-06-14 1975-06-14 The best way to do it

Publications (2)

Publication Number Publication Date
JPS51148361A true JPS51148361A (en) 1976-12-20
JPS588577B2 JPS588577B2 (en) 1983-02-16

Family

ID=13493533

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7258375A Expired JPS588577B2 (en) 1975-06-14 1975-06-14 The best way to do it

Country Status (1)

Country Link
JP (1) JPS588577B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010644A (en) * 1983-06-30 1985-01-19 Toshiba Corp Semiconductor device and manufacture thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010644A (en) * 1983-06-30 1985-01-19 Toshiba Corp Semiconductor device and manufacture thereof
JPH0226374B2 (en) * 1983-06-30 1990-06-08 Tokyo Shibaura Electric Co

Also Published As

Publication number Publication date
JPS588577B2 (en) 1983-02-16

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